公开(公告)号：JPH10142413A

公开(公告)日：1998-05-29

申请号：JP28327697

申请日：1997-10-16

Applicant: LUCENT TECHNOLOGIES INC

Inventor： KOHNKE GLENN ERIC ,  STRASSER THOMAS A

IPC: G02B5/18 ,  C03B37/00 ,  G02B6/02 ,  G02B6/10

Abstract: PROBLEM TO BE SOLVED: To provide a method and device for manufacturing an optical fiber plug grating which is continuously chirped. SOLUTION: The continuously chirped optical fiber plug grating is made by writing-in the plug grating on an optical fiber by using a phase mask continuously chirped. The chirped phase mask is made by exposing a mask substrate 23 coated with a photoresist to two interference beams 24, 25 in which one of beams is a colimated beam and another is a beam reflected at a smoothly curved mirror 26. The optical fiber grating has a broadened band width and an uniform dispersion delay characteristic which is effective against dispersion compensation in high-degree communication application.

公开(公告)号：AU739886B2

公开(公告)日：2001-10-25

申请号：AU4363497

申请日：1997-10-29

Applicant: LUCENT TECHNOLOGIES INC

Inventor： KOHNKE GLENN ERIC ,  STRASSER THOMAS A

IPC: G02B5/18 ,  C03B37/00 ,  G02B6/02 ,  G02B6/10 ,  G02B6/18

Abstract: A continuously phased chirped phase mask is made by forming a UV transparent material having a planar surface coated with a photoresist (22) and exposing the resist to the pattern of light formed by the interference of a first portion of a direct collimated beam (24) and a second portion of the collimated beam (25) which is reflected from a continuously curved mirror (26). The resist is then developed and the substrate is etched to produce the phase mask.

公开(公告)号：AU4363497A

公开(公告)日：1998-05-07

申请号：AU4363497

申请日：1997-10-29

Applicant: LUCENT TECHNOLOGIES INC

Inventor： KOHNKE GLENN ERIC ,  STRASSER THOMAS A

IPC: G02B5/18 ,  C03B37/00 ,  G02B6/02 ,  G02B6/10 ,  G02B6/18

Abstract: A continuously phased chirped phase mask is made by forming a UV transparent material having a planar surface coated with a photoresist (22) and exposing the resist to the pattern of light formed by the interference of a first portion of a direct collimated beam (24) and a second portion of the collimated beam (25) which is reflected from a continuously curved mirror (26). The resist is then developed and the substrate is etched to produce the phase mask.