公开(公告)号：AU1158288A

公开(公告)日：1988-08-24

申请号：AU1158288

申请日：1987-09-10

Applicant: MACDERMID INC

Inventor： BACH WOLF ,  MARTIN THEODORE A JR

IPC: C11D7/06 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  G03F7/42

公开(公告)号：CA2052931A1

公开(公告)日：1992-08-01

申请号：CA2052931

申请日：1991-10-07

Applicant: MACDERMID INC

Inventor： MARTIN THEODORE A JR

IPC: C23C18/40 ,  C23C18/16 ,  H05K3/18

Abstract: 501-175 PROCESS AND PROGRAMMABLE COMPUTER CONTROLLED SYSTEM FOR ELECTROLESS COPPER PLATING A process is provided for maintaining the level of cyanide ion stabilizer in an electroless copper plating bath held at a constant predetermined temperature by making additions of predetermined amounts of cyanide ion feedstock at predetermined time intervals. The properties of the copper layer deposited on a substrate by means of the system are significantly improved in uniformity and structural strength. In addition, The plating rate and stability of the bath are far more uniform. A programmable computer system for controlling the process of the invention is also described.

公开(公告)号：EP0301044A4

公开(公告)日：1989-03-29

申请号：EP88900899

申请日：1987-09-10

Applicant: MACDERMID INC

Inventor： MARTIN THEODORE A JR ,  BACH WOLF

IPC: C11D7/06 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  G03F7/42

CPC classification number: C11D7/06 ,  C11D7/263 ,  C11D7/267 ,  C11D7/3209 ,  C11D7/3281 ,  C11D7/5013

Abstract: A photoresist stripper composition comprises a mixture of (a) pyrrolidone, N-substituted pyrrolidones, butyrolactone or caprolactone as the major component and (b) from about 2 to about 10 percent by weight of a tetraalkylammonium hydroxide or a trialkylaralkylammonium hydroxide. Optional components of the mixture include surfactants, diluents and metal corrosion inhibitors. Extraneously added water is avoided. The compositions are efficient in stripping photoresists which, by reason of processing conditions, have become highly cross-linked and resistant to removal by solvents other than hot phenolic or halohydrocarbon strippers.

Abstract translation: 光刻胶剥离剂组合物包含（a）吡咯烷酮，N-取代的吡咯烷酮，丁内酯或己内酯作为主要组分的混合物和（b）约2至约10重量％的四烷基氢氧化铵或三烷基芳基氢氧化铵。 混合物的任选组分包括表面活性剂，稀释剂和金属腐蚀抑制剂。 避免外加水。 该组合物有效剥离光致抗蚀剂，由于加工条件的原因，该抗光蚀剂已变得高度交联并且耐受除热酚或脱卤剂以外的溶剂的去除。