Abstract:
A field emission device (FED) comprising an amorphous substrate; impurity diffusion preventing layer; FET formed on a formation surface of a semiconductor layer made of amorphous silicon or polycrystalline silicon; one or more emitters made by etching the semiconductor layer of the FET drain region; and extraction electrode. The semiconductor layer is made by CVD process. The emitter array is formed within a ring or polygonal FET drain region, and surrounded by the ring or polygonal gate electrode and source electrode. The entire FET region is covered with an insulation layer and metal layer. This configuration provides uniform current emission characteristics among emitter chips, and achieves uniform electron emissions to all directions. Application of present FED to a flat panel display device achieves high picture quality, low power consumption, and low manufacturing cost.
Abstract:
PROBLEM TO BE SOLVED: To provide a transmission type screen which has high transmissivity and superior viewing angle characteristics. SOLUTION: The light transmission type screen which converges, diffuses, and transmits incident image light includes a light transmissive substrate 1 having a solid light shield layer 6 which absorbs external light, a spherical light diffusing lens 8 provided at a light shield layer opening portion 10, and a reflective layer 7 formed at a light shield layer angled portion, and a critical point position on the border between a reflective layer portion which totally reflects the incident light on a tapered surface of the solid light shield layer 6 and a spherical light diffusing lens portion which diffuses the incident light is disposed closer to the light transmissive flat plate substrate 1 than to the base position of the solid light shield layer 6. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method for a light shielding layer for a transmission type screen, by which the residue of the light shielding layer for the transmission type screen is reduced and light transmittance of the screen can be improved. SOLUTION: The manufacturing method for the light shielding layer of the transmission type screen includes: a step of applying a black resin solution onto a mold and/or transparent base material; and a step of firmly bonding the mold and the transparent base material together, and curing the black resin solution, thereby transferring the mold pattern to the surface of the transparent base material. In this method, the light shielding layer for the transmission type screen is manufactured by heating the transparent base material at a temperature of Tg>Ts>Tm, wherein Ts is the temperature of the transparent base material, Tg is the glass transient temperature of the transparent base material, and Tm is the temperature of the mold. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a design which can make an ink delivery amount at each channel constant even when the ink delivery amount is varied in particular as a result of an unequal deformation volume of bulkheads due to a difference of flexible stiffness of bulkheads of ink chambers in an ink jet head device which has two or more channel strings separated by bulkheads of piezoelectric elements to be mutually parallel, and discharges ink by displacing the bulkheads in response to an impressed voltage to electrodes formed at both faces of each channel. SOLUTION: A substrate used as a foundation of the bulkhead is formed of the piezoelectric element. Electrodes are added to a part, or two or more points of an outer surface of the substrate. The ink delivery amount from each ink delivery opening can be made constant by displacing the substrate beforehand through voltage application to the additional electrodes in the design. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a frequency shift keying demodulator, in which a modulated signal can be accurately demodulated in simple circuit configuration by a frequency shift keying system. SOLUTION: A PLL circuit is not used for processing for generating a demodulated baseband signal from an IF signal. Therefore, entire circuit configuration is simplified and further, since a signal and noise can be separated by a filter circuit, receiving characteristics can be improved.
Abstract:
PURPOSE:To increase a current necessary to turn ON a parasitic transistor having a substrate as a base thereby to improve the latchup strength by forming the same conductivity type and high concentration impurity region as the substrate on the substrate and connecting the impurity region to a power terminal by a conductor. CONSTITUTION:A high concentration N-type impurity region 23 is formed on a low concentration N-type semiconductor substrate 1, and a low concentration N-type impurity region 24 is formed on the region 23, a high concentration N-type impurity region 25 which penetrates to the region 23 is formed thereon, a low concentration P-type impurity region 2, and source and drain regions 4 and 3 of high concentration P-type impurity regions are formed, and a conductive electrode 13 on the region 4 and a conductive electrode 26 on the region 25 are connected to a power terminal 20. The region having the same potential as the power source is formed in a wide range on the substrate 1 to reduce a resistance due to the substrate from the region 2 to the power source. A current necessary to turn ON the parasitic transistor is increased to improve the latchup strength.
Abstract:
PROBLEM TO BE SOLVED: To provide a light diffusion sheet which is for a transmission type screen, and which has excellent diffusion performance in such a way that an observer does not feel abnormal even when an image is observed while varying a viewing angle. SOLUTION: The light diffusion sheet is equipped with: a light emitting side substrate 2 being a transparent substrate; light shielding bodies 3 with triangular shapes in cross sections arranged on one face of the light emitting side substrate 2 with an opening portion to be a light transmitting portion interposed in between; reflection lenses 7 disposed on slopes of the light shielding bodies 3 with triangular shapes in cross sections and formed with transparent resin layers with a first refractive index; a spherical refracting lens 8 formed on the opening portion 6 between adjacent light shielding bodies 3, formed with the transparent resin layer having the first refractive index; and a light incident side resin layer 5 covering the reflection lenses 7 and the spherical refracting lens 8, and formed with a transparent resin layer having a second refractive index which is higher than the first refractive index. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To realize a cold electron emitting element capable of controlling emission characteristics of an isotropic and stable cold electron, by a simple manufacturing method. SOLUTION: This cold electron emitting element is composed of a field effect transistor(FET) formed on the grown surface obtained by growing a semiconductor layer 2 on a glass substrate 1 through a preventive layer 8 for diffusion of impurities, a conical emitter 10 having a sharpened tip, which is formed by applying an etching process to the semiconductor layer in an area serving as the drain area 6 of the FET, and an extraction electrode 11 to apply a high electric field to the emitter.
Abstract:
PROBLEM TO BE SOLVED: To provide a cold electron emitting element fabricated through a simple procedure capable of controlling the isotropic and stable cold electron emitting characteristics. SOLUTION: On a glass board 1, a semiconductor layer 2 is grown with an impurity dispersion preventing layer 8 interposed so that a field effect transistor(FET) is formed on the surface of growth, and the semiconductor layer of this FET in its portion to serve as a drain region 6 is subjected to etching so that a cone type emitter 10 is formed whose forefront is sharpened, and an intended cold electron emitting element is composed of the mentioned FET and cone type emitter 10, and a drawout electrode 11 which is to impress a high electric field on the emitter.
Abstract:
PURPOSE:To obtain the MOS-LSI strong against electrostatic surge by a method wherein the difference in potential generated across both ends of a MOS gate oxide film by electrostatic surge is reduced by forming a capacitor composed of two electrodes connected to each of a MOS gate electrode and a drain impurity region. CONSTITUTION:A source region 2 and a drain region 3 which are P type impurity regions are formed in an N type semiconductor substrate 1, and conductive electrodes 5 and 6 are formed on both the regions, respectively. The conductive electrode 5 is connected to the power source terminal of a MOS-LSI, and the electrode 6 to the output terminal of the MOS-LSI. A gate oxide film 9 connecting the source region 2 and the drain region 3 is formed, and a dielectric film 12 continuous to the film 9 is formed on the drain region 3; then, the gate electrode 4 is formed on both the films. This manner enables the construction of capacitor Co connected in parallel with a capacitor Cg parasitizing to the overlap of the gate electrode 4 on the drain region 3 via gate oxide film 9 without formation of an electrode.