ETCHING AGENT AND REPLENISHING SOLUTION THEREFOR, METHOD FOR ROUGHENING SURFACE OF MAGNESIUM COMPONENT, AND METHOD FOR MANUFACTURING MAGNESIUM-RESIN COMPOSITE
    1.
    发明公开
    ETCHING AGENT AND REPLENISHING SOLUTION THEREFOR, METHOD FOR ROUGHENING SURFACE OF MAGNESIUM COMPONENT, AND METHOD FOR MANUFACTURING MAGNESIUM-RESIN COMPOSITE 审中-公开
    蚀刻剂及其清除溶液,镁组分表面粗化方法及镁 - 树脂复合材料的制造方法

    公开(公告)号:EP3228730A1

    公开(公告)日:2017-10-11

    申请号:EP15866351.8

    申请日:2015-09-17

    Abstract: The etching agent is an aqueous solution including at least one acid selected from the group consisting of inorganic acids other than nitric acid, and organic acids; and an organic nitrogen compound having a molecular structure containing N-OH or N-O-. The acid concentration of the etching agent is 0.05 to 3 % by weight, and the organic nitrogen compound concentration of the etching agent is 0.005 to 5 % by weight. By bringing the etching agent into contact with a surface of a magnesium component, fine irregularities can be formed on the surface of the magnesium component even when etching depth is large.

    Abstract translation: 蚀刻剂是包括选自除硝酸以外的无机酸和有机酸中的至少一种酸的水溶液; 和具有含N-OH或N-O-的分子结构的有机氮化合物。 蚀刻剂的酸浓度为0.05〜3重量%,蚀刻剂的有机氮化合物浓度为0.005〜5重量%。 通过使蚀刻剂与镁成分的表面接触,即使在蚀刻深度大的情况下,也能够在镁成分的表面形成微细的凹凸。

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