-
公开(公告)号:US20170268112A1
公开(公告)日:2017-09-21
申请号:US15531764
申请日:2015-09-17
Applicant: MEC COMPANY LTD.
Inventor: Daisaku AKIYAMA , Mina RAIJO
CPC classification number: C23F1/22 , B29C45/02 , B29C45/14 , B29C45/14311 , B29K2705/00
Abstract: The etching agent is an aqueous solution including at least one acid selected from the group consisting of inorganic acids other than nitric acid, and organic acids; and an organic nitrogen compound having a molecular structure containing N—OH or N—O−. The acid concentration of the etching agent is 0.05 to 3% by weight, and the organic nitrogen compound concentration of the etching agent is 0.005 to 5% by weight. By bringing the etching agent into contact with a surface of a magnesium component, fine irregularities can be formed on the surface of the magnesium component even when etching depth is large.
-
公开(公告)号:US20170167033A1
公开(公告)日:2017-06-15
申请号:US15323856
申请日:2015-06-05
Applicant: MEC COMPANY LTD.
Inventor: Yoichi SENGOKU , Mina RAIJO , Daisaku AKIYAMA
IPC: C23F1/28
CPC classification number: C23F1/28
Abstract: Disclosed is an etching agent for steel. The etching agent is an acidic aqueous solution including ferrous ions, ferric ions, and an acetylene group-containing water-soluble compound. The concentration of ferrous ion A % by weight and the concentration of ferric ion B % by weight in the etching agent is preferably from 0.1 to 2.5. Also disclosed is a replenishing liquid that is added to the etching agent when the etching agent is continuously or repeatedly used. The replenishing liquid is an aqueous solution including an acetylene group-containing water-soluble compound.
-