Abstract:
An optical switching matrix, made from a semiconductor-D dielectric-based substrate, comprising: at least one set of optical input fibers (12) and at least one set of optical output fibers (14) oriented substantially perpendicular to each other, a set of moveable mirrors (5, 13) placed at the intersections of the directions defined by the various optical fibers, each mirror (13) being capable of moving in order to reflect a beam coming from an optical input fiber, bound for an optical output fiber, a set of channels defined between the mirrors, inside which the various beams are propagated before and after having encountered the mirrors, in which: the set of mirrors is made on a first substrate wafer (2), said first wafer being covered with a second substrate wafer (20), the various channels (38) are formed between protruding zones (34) present under the second substrate wafer, said protruding zones comprising housings (33) inside which the moveable mirrors are able to move.
Abstract:
Process for fabricating a microelectromechanical optical component (1) produced from a silicon substrate, comprising: optical propagation guides (2-5); a wall (6) which can move with respect to the propagation guides (2-5); and an electrostatic actuator (10) associated with return means formed by at least one beam (15, 16) which is capable of causing the moving wall (6) to move with respect to the rest of the substrate. According to the invention: the substrate used is made of single-crystal silicon, the (111) crystalographic planes of which are parallel to the plane of the substrate; the process comprises a first series of deep reactive ion etching steps during which the heights of the moving wall (6), of the electrodes of the actuator (11, 12), and of the beams (15, 16) of the return means of the actuator are defined with different values; and the process comprises a second wet etching step, making it possible to free the moving wall (6), the electrodes (11, 12) and the beams (15, 16) from the rest of the substrate