公开(公告)号：WO1997005994A1

公开(公告)日：1997-02-20

申请号：PCT/US1996012647

申请日：1996-08-02

Applicant: MICROCOATING TECHNOLOGIES

Inventor： MICROCOATING TECHNOLOGIES ,  HUNT, Andrew, T. ,  HORNIS, Helmut, G.

IPC: B29B09/00

CPC classification number: C23C16/453 ,  B05D1/08 ,  B05D2401/90 ,  B22F9/28 ,  C01B13/34 ,  C23C16/4486 ,  Y02P20/544 ,  Y02T50/67 ,  Y10T428/25 ,  Y10T428/256 ,  Y10T428/265

Abstract: A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid (T) or liquid-like fluid (T) near its supercritical temperature, where the resulting atomized or vaporized solution (N) is entered into a flame or a plasma torch (170), and a powder is formed or a coating is deposited onto a substrate (190). The combustion flame (170) can be stable from 10 torr to multiple atmospheres, and provides the energetic environment in which the reagent contained within the fluid (T) can be reacted to form the desired powder or coating material on a substrate (190). The plasma torch likewise produces the required energy environment, but, unlike the flame, no oxidizer is needed so materials stable in only very low oxygen partial pressures can be formed. Using either the plasma torch or the combustion flame (170), coatings can be deposited and powders formed in the open atmosphere without the necessity of a reaction chamber, but a chamber may be used for various reasons including process separation from the environment and pressure regulation.

Abstract translation: 使用在其超临界温度附近使含有液体（T）或液体状流体（T）的试剂非常细小雾化或汽化的化学气相沉积方法，其中所得雾化或汽化溶液（N）进入火焰或 等离子体焰炬（170），并且形成粉末或将涂层沉积到衬底（190）上。 燃烧火焰（170）可以从10托稳定到多个大气压，并且提供能够使流体（T）中包含的试剂反应以在基底（190）上形成所需粉末或涂层材料的能量环境。 等离子体焰炬同样产生所需的能量环境，但是与火焰不同，不需要氧化剂，因此可以形成仅在非常低的氧分压下稳定的材料。 使用等离子体焰炬或燃烧火焰（170），涂层可以沉积并且在开放气氛中形成粉末，而不需要反应室，但是可以由于各种原因使用室，包括与环境的分离和压力调节 。

公开(公告)号：EP0848658A1

公开(公告)日：1998-06-24

申请号：EP96928045.0

申请日：1996-08-02

Applicant: Microcoating Technologies

Inventor： HUNT, Andrew, T. ,  HORNIS, Helmut, G.

IPC: H05H1 ,  B05D1 ,  B22F9 ,  C01B13 ,  C23C16

CPC classification number: C23C16/453 ,  B05D1/08 ,  B05D2401/90 ,  B22F9/28 ,  C01B13/34 ,  C23C16/4486 ,  Y02P20/544 ,  Y02T50/67 ,  Y10T428/25 ,  Y10T428/256 ,  Y10T428/265

Abstract: A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid (T) or liquid-like fluid (T) near its supercritical temperature, where the resulting atomized or vaporized solution (N) is entered into a flame or a plasma torch (170), and a powder is formed or a coating is deposited onto a substrate (190). The combustion flame (170) can be stable from 10 torr to multiple atmospheres, and provides the energetic environment in which the reagent contained within the fluid (T) can be reacted to form the desired powder or coating material on a substrate (190). The plasma torch likewise produces the required energy environment, but, unlike the flame, no oxidizer is needed so materials stable in only very low oxygen partial pressures can be formed. Using either the plasma torch or the combustion flame (170), coatings can be deposited and powders formed in the open atmosphere without the necessity of a reaction chamber, but a chamber may be used for various reasons including process separation from the environment and pressure regulation.