公开(公告)号：DE60228685D1

公开(公告)日：2008-10-16

申请号：DE60228685

申请日：2002-05-16

Applicant: MICRONIT MICROFLUIDICS BV

Inventor： SCHLAUTMANN STEFAN ,  GARDENIERS JOHANNES GERARDUS E ,  VAN DEN BERG ALBERT

IPC: B81B1/00 ,  B01L3/00 ,  B81C1/00 ,  G01N33/487

Abstract: The invention relates to a microfluidic device comprising: a substrate provided with a fluid channel; a plurality of electro osmotic flow drive sections for providing electro osmotic flow in the channel, each drive section comprising electric field electrodes, exposed to the channel, and one or more gate electrodes, separated from the channel by an insulating layer, and control means connected to said electrodes of each drive section so as to control the direction of the electro osmotic flow in the channel.

公开(公告)号：AT407096T

公开(公告)日：2008-09-15

申请号：AT02076937

申请日：2002-05-16

Applicant: MICRONIT MICROFLUIDICS BV

Inventor： SCHLAUTMANN STEFAN ,  GARDENIERS JOHANNES GERARDUS ELISABET ,  VAN DEN BERG ALBERT

IPC: B81B1/00 ,  B01L3/00 ,  B81C1/00 ,  G01N33/487

Abstract: The invention relates to a microfluidic device comprising: a substrate provided with a fluid channel; a plurality of electro osmotic flow drive sections for providing electro osmotic flow in the channel, each drive section comprising electric field electrodes, exposed to the channel, and one or more gate electrodes, separated from the channel by an insulating layer, and control means connected to said electrodes of each drive section so as to control the direction of the electro osmotic flow in the channel.

公开(公告)号：CA2428980A1

公开(公告)日：2003-11-16

申请号：CA2428980

申请日：2003-05-16

Applicant: MICRONIT MICROFLUIDICS BV

Inventor： GARDENIERS JOHANNES GERARDUS E ,  SCHLAUTMANN STEFAN ,  VAN DEN BERG ALBERT

IPC: B01L3/00 ,  B81B1/00 ,  B81C1/00 ,  G01N33/487 ,  C03C27/02 ,  C23F1/00 ,  C09K13/00 ,  C23C16/06 ,  B32B15/08

Abstract: The present invention relates to a method of fabricating a microfluidic device including at least two substrates provided with a fluid channel, comprising tho steps of: a) etching at least a channel and one or more fluid ports in a first and/or a second substrate; b) depositing a first layer on a surface of the second substrate; c) partially removing the first layer in accordance with a predefined geometry; d) depositing a second layer on top of the first layer and the substrate surface; e) planarizing the second layer so as to smooth the upper surface thereof; f) aligning the first end second substrate; g) bonding the first substrate on the planarized second layer of the second substrate.