SUBSTRATE HAVING A CARBON RICH COATING
    2.
    发明申请
    SUBSTRATE HAVING A CARBON RICH COATING 审中-公开
    具有碳化硅涂层的基材

    公开(公告)号:WO1995004350A1

    公开(公告)日:1995-02-09

    申请号:PCT/US1993007295

    申请日:1993-08-03

    CPC classification number: G11B5/725 C23C16/26 C23C16/513 G11B5/72 G11B5/8408

    Abstract: The present invention provides a magnetic recording medium that includes a polymeric flexible substrate and a magnetic layer coating thereon, with a binderless carbon rich layer adhered to the magnetic layer. The present invention also provides a process for the plasma deposition of the carbon rich coating onto a substrate comprising the steps of: a) providing a substrate in a vacuum chamber; b) generating carbon rich plasma in the vacuum chamber by injecting a plasma gas suitable to provide a carbon rich coating into an elongated hollow cathode; and providing a sufficient voltage to create and maintain plasma; and maintaining a vacuum in the vacuum chamber sufficient for the plasma; and c) exposing the substrate to the plasma while the magnetic medium is influenced by a radio frequency bias electrode to accelerate the plasma toward the substrate and deposit the carbon rich coating on the substrate.

    Abstract translation: 本发明提供了一种磁记录介质,其包括聚合物柔性基底和其上的磁性层涂层,其中无粘结剂碳富集层粘附到磁性层。 本发明还提供了一种用于将富碳涂层等离子体沉积到衬底上的方法,包括以下步骤:a)在真空室中提供衬底; b)通过将适合于提供富碳涂层的等离子体气体注入细长空心阴极,在真空室中产生富碳等离子体; 并提供足够的电压来产生和维持等离子体; 并且在真空室中保持足够的等离子体的真空; 以及c)将所述衬底暴露于所述等离子体,同时所述磁介质受到射频偏置电极的影响,以将所述等离子体加速到所述衬底并将所述富碳涂层沉积在所述衬底上。

    SUBSTRATE HAVING A CARBON RICH COATING
    3.
    发明授权
    SUBSTRATE HAVING A CARBON RICH COATING 失效
    与富含碳衣基

    公开(公告)号:EP0712530B1

    公开(公告)日:1997-10-29

    申请号:EP93919872.7

    申请日:1993-08-03

    CPC classification number: G11B5/725 C23C16/26 C23C16/513 G11B5/72 G11B5/8408

    Abstract: The present invention provides a magnetic recording medium that includes a polymeric flexible substrate and a magnetic layer coating thereon, with a binderless carbon rich layer adhered to the magnetic layer. The present invention also provides a process for the plasma deposition of the carbon rich coating onto a substrate comprising the steps of: a) providing a substrate in a vacuum chamber; b) generating carbon rich plasma in the vacuum chamber by injecting a plasma gas suitable to provide a carbon rich coating into an elongated hollow cathode; and providing a sufficient voltage to create and maintain plasma; and maintaining a vacuum in the vacuum chamber sufficient for the plasma; and c) exposing the substrate to the plasma while the magnetic medium is influenced by a radio frequency bias electrode to accelerate the plasma toward the substrate and deposit the carbon rich coating on the substrate.

    SUBSTRATE HAVING A CARBON RICH COATING
    5.
    发明公开
    SUBSTRATE HAVING A CARBON RICH COATING 失效
    与富含碳衣基

    公开(公告)号:EP0712530A1

    公开(公告)日:1996-05-22

    申请号:EP93919872.0

    申请日:1993-08-03

    CPC classification number: G11B5/725 C23C16/26 C23C16/513 G11B5/72 G11B5/8408

    Abstract: The present invention provides a magnetic recording medium that includes a polymeric flexible substrate and a magnetic layer coating thereon, with a binderless carbon rich layer adhered to the magnetic layer. The present invention also provides a process for the plasma deposition of the carbon rich coating onto a substrate comprising the steps of: a) providing a substrate in a vacuum chamber; b) generating carbon rich plasma in the vacuum chamber by injecting a plasma gas suitable to provide a carbon rich coating into an elongated hollow cathode; and providing a sufficient voltage to create and maintain plasma; and maintaining a vacuum in the vacuum chamber sufficient for the plasma; and c) exposing the substrate to the plasma while the magnetic medium is influenced by a radio frequency bias electrode to accelerate the plasma toward the substrate and deposit the carbon rich coating on the substrate.

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