公开(公告)号：EP0455247A2

公开(公告)日：1991-11-06

申请号：EP91107132.2

申请日：1991-05-02

Applicant: MITA INDUSTRIAL CO. LTD.

Inventor： Miyamoto, Eiichi ,  Muto, Nariaki ,  Maeda, Tatsuo ,  Sumida, Keisuke ,  Kimura, Tadao

IPC: C07C211/54 ,  C07C217/92 ,  G03G5/06

CPC classification number: G03G5/0614 ,  C07C211/54 ,  C07C211/56 ,  C07C217/92 ,  C07C223/06 ,  C07C225/22 ,  C07C229/60 ,  C07C255/58 ,  C07C309/46

Abstract: The present invention provides a m-phenylenediamine compound of the following general formula (I), (II) or (III). This compound is excellent in photostability. Accordingly, when this compound is contained in a photosensitive layer as an electric charge transferring material, there may be obtained an eletrophotosensitive material excellent in photostability.

wherein R¹, R², R³, R⁴, R⁵, R⁶, R⁷, R⁸, R⁹, l , m , o , p, q, r and s are as defined above.

Abstract translation: 本发明提供以下通式（I），（II）或（III）的间苯二胺化合物。 该化合物的光稳定性优异。 因此，当该化合物作为电荷转移材料包含在感光层中时，可以获得光稳定性优异的光电材料。 其中R 1，R 2，R 3，R 4，R 5，R 6，R 7，R 8，R 9， >，l，m，o，p，q，r和s如上所定义。

公开(公告)号：EP0390195A1

公开(公告)日：1990-10-03

申请号：EP90106166.3

申请日：1990-03-30

Applicant: MITA INDUSTRIAL CO., LTD.

Inventor： Muto, Nariaki ,  Kakui, Mikio ,  Sumida, Keisuke ,  Nakazawa, Toru ,  Matsumoto, Kazuo

IPC: G03G5/06

CPC classification number: G03G5/0614

Abstract: The present invention provides an electrophoto­sensitive material comprising a conductive substrate. and a photosensitive layer provided on the conductive substrate and containing a m-phenylenediamine compound represented by the general formula [I]:
wherein R¹, R², R³, R⁴ and R are the same as one another, or are different from one another, and re­present a hydrogen atom, an alkyl group, an alkoxy group or a halogen atom, provided that, when one of R¹ and R⁴ is the hydrogen atom, the other should not be the hydrogen atom, ahd when one of R² and R³ is the hydrogen atom, the other should not be the hydrogen atom.

Abstract translation: 本发明提供一种包含导电基材的电光敏材料。 和设置在导电基体上并含有由通式[Ⅰ]代表的间苯二胺化合物的光敏层：其中R 1，R 2，R 3，R 4和R彼此相同或彼此不同，以及 代表氢原子，烷基，烷氧基或卤素原子，条件是当R 1和R 4中的一个是氢原子时，另一个不应该是氢原子，当R 2和R 3之一是氢时 原子，另一个不应该是氢原子。

公开(公告)号：EP0801331A2

公开(公告)日：1997-10-15

申请号：EP97111024.2

申请日：1993-01-20

Applicant: MITA INDUSTRIAL CO. LTD.

Inventor： Muto, Nariaki ,  Sumida, Keisuke ,  Iwasaki, Hiroaki ,  Oki, Tsuneo ,  Miyamoto, Eiichi ,  Hanatani, Yasuyuki ,  Sakai, Hiroaki

IPC: G03G5/06

CPC classification number: G03G5/0609 ,  G03G5/0517 ,  G03G5/0521 ,  G03G5/0564 ,  G03G5/0578 ,  G03G5/0614 ,  G03G5/0616 ,  G03G5/062 ,  G03G5/0629 ,  G03G5/0631 ,  G03G5/0657 ,  G03G5/0681 ,  G03G5/0685 ,  G03G5/0688

Abstract: An electrophotosensitive material is provided comprising a photosensitive layer formed on a conductive substrate. The material of the layer includes a bis-azo pigment as a charge generating material and a diamine compound as a charge transferring material. The photosensitive layer may further comprise a diphenoquinone derivative. Furthermore, other additives may include a hydrazone compound and/or a fluorene compound. Preferably, the photosensitive material is set in a binding resin comprising a polycarbonate and a polyester having a specific repeat unit.

Abstract translation: 提供了包括形成在导电基底上的感光层的电光敏材料。 该层的材料包括作为电荷产生材料的双偶氮颜料和作为电荷转移材料的二胺化合物。 感光层还可以包含二苯醌衍生物。 此外，其它添加剂可以包括腙化合物和/或芴化合物。 优选地，将感光材料设置在包含聚碳酸酯和具有特定重复单元的聚酯的粘合树脂中。

公开(公告)号：EP0690351B1

公开(公告)日：1998-08-26

申请号：EP95303624.1

申请日：1995-05-26

Applicant: MITA INDUSTRIAL CO. LTD.

Inventor： Fukami, Toshiyuki ,  Nakamori, Hideo ,  Shiomi, Hiroshi ,  Kawaguchi, Hirofumi ,  Uegaito, Hisakazu ,  Muto, Nariaki ,  Kakui, Mikio ,  Sumida, Keisuke ,  Saito, Sakae ,  Uchida, Maki

IPC: G03G5/06

CPC classification number: G03G5/0681 ,  G03G5/0605 ,  G03G5/0607 ,  G03G5/0609 ,  G03G5/0612 ,  G03G5/0618 ,  G03G5/062 ,  G03G5/0679

公开(公告)号：EP0690351A3

公开(公告)日：1996-01-17

申请号：EP95303624.1

申请日：1995-05-26

Applicant: MITA INDUSTRIAL CO. LTD.

Inventor： Fukami, Toshiyuki ,  Nakamori, Hideo ,  Shiomi, Hiroshi ,  Kawaguchi, Hirofumi ,  Uegaito, Hisakazu ,  Muto, Nariaki ,  Kakui, Mikio ,  Sumida, Keisuke ,  Saito, Sakae ,  Uchida, Maki

IPC: G03G5/06

CPC classification number: G03G5/0681 ,  G03G5/0605 ,  G03G5/0607 ,  G03G5/0609 ,  G03G5/0612 ,  G03G5/0618 ,  G03G5/062 ,  G03G5/0679

Abstract: The present invention provides an electrophotosensitive material having an improved sensitivity in comparison with a conventional one, obtained by combining a trinitrofluorenoneimine derivative represented by the formula (1):

[wherein R¹, R, R³, R⁴ and R⁵ are the same or different and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group which may contain a substituent, an aralkyl group which may contain a substituent, or a halogen atom] as an electron transferring material with a prescribed electric charge generating material or hole transferring material.

公开(公告)号：EP0390196B1

公开(公告)日：1995-09-20

申请号：EP90106167.1

申请日：1990-03-30

Applicant: MITA INDUSTRIAL CO., LTD.

Inventor： Muto, Nariaki ,  Maeda, Tatsuo ,  Nishiguchi, Toshihiko ,  Kakui, Mikio ,  Sumida, Keisuke ,  Nakazawa, Toru

IPC: G03G5/06

CPC classification number: G03G5/0629 ,  G03G5/0614 ,  G03G5/0616

公开(公告)号：EP0455247A3

公开(公告)日：1992-05-13

申请号：EP91107132.2

申请日：1991-05-02

Applicant: MITA INDUSTRIAL CO. LTD.

Inventor： Miyamoto, Eiichi ,  Muto, Nariaki ,  Maeda, Tatsuo ,  Sumida, Keisuke ,  Kimura, Tadao

IPC: C07C211/54 ,  C07C217/92 ,  G03G5/06

CPC classification number: G03G5/0614 ,  C07C211/54 ,  C07C211/56 ,  C07C217/92 ,  C07C223/06 ,  C07C225/22 ,  C07C229/60 ,  C07C255/58 ,  C07C309/46

Abstract: The present invention provides a m-phenylenediamine compound of the following general formula (I), (II) or (III). This compound is excellent in photostability. Accordingly, when this compound is contained in a photosensitive layer as an electric charge transferring material, there may be obtained an eletrophotosensitive material excellent in photostability.
wherein R¹, R², R³, R⁴, R⁵, R⁶, R⁷, R⁸, R⁹, l , m , o , p, q, r and s are as defined above.

公开(公告)号：EP0390196A2

公开(公告)日：1990-10-03

申请号：EP90106167.1

申请日：1990-03-30

Applicant: MITA INDUSTRIAL CO., LTD.

Inventor： Muto, Nariaki ,  Maeda, Tatsuo ,  Nishiguchi, Toshihiko ,  Kakui, Mikio ,  Sumida, Keisuke ,  Nakazawa, Toru

IPC: G03G5/06

CPC classification number: G03G5/0629 ,  G03G5/0614 ,  G03G5/0616

Abstract: The present invention provides an electrophotosensitive material containing the diamine derivative represented by the following general formula (I) and at least one selected from the group consisting of the hydrazone compound, fluorene compound and m-phenylenediamine compound.
wherein R⁵ to R⁹, l, m, n, o and p are as defined.

Abstract translation: 本发明提供含有由下述通式（I）表示的二胺衍生物和选自腙化合物，芴化合物和间苯二胺化合物中的至少一种的光电敏感材料。 其中R 5至R 8，l，m，n，o和p如上定义。

公开(公告)号：EP0799818A3

公开(公告)日：2000-03-15

申请号：EP97201945.9

申请日：1994-10-11

Applicant: MITA INDUSTRIAL CO. LTD.

Inventor： Mizuta, Yasufumi ,  Tanaka, Masashi ,  Muto, Nariaki ,  Fukami, Toshiyuki ,  Nakamori, Hideo ,  Kakui, Mikio ,  Saito, Sakae ,  Shiomi, Hiroshi ,  Sumida, Keisuke ,  Uchida, Maki

IPC: C07C211/54 ,  G03G5/06

CPC classification number: C07C211/54 ,  G03G5/0614

Abstract: The present invention relates to a benzidine derivative represented by the general formula (3): wherein R 17 to R 24 are as defined in the present specification. The invention also relates to a benzidine derivative represented by the general formulae (3'), (4), (5) and (6), disclosed herein. The benzidine derivatives improve durability and heat resistance of a membrane containing the same while maintaining high hole transferring capability. Therefore, an electrophotosensitive material, which comprises a photosensitive layer containing the benzidine derivative, has high sensitivity and is superior in durability and heat resistance.

公开(公告)号：EP0801331A3

公开(公告)日：1997-11-05

申请号：EP97111024.2

申请日：1993-01-20

Applicant: MITA INDUSTRIAL CO. LTD.

Inventor： Muto, Nariaki ,  Sumida, Keisuke ,  Iwasaki, Hiroaki ,  Oki, Tsuneo ,  Miyamoto, Eiichi ,  Hanatani, Yasuyuki ,  Sakai, Hiroaki

IPC: G03G5/06

CPC classification number: G03G5/0609 ,  G03G5/0517 ,  G03G5/0521 ,  G03G5/0564 ,  G03G5/0578 ,  G03G5/0614 ,  G03G5/0616 ,  G03G5/062 ,  G03G5/0629 ,  G03G5/0631 ,  G03G5/0657 ,  G03G5/0681 ,  G03G5/0685 ,  G03G5/0688

Abstract: An electrophotosensitive material is provided comprising a photosensitive layer formed on a conductive substrate. The material of the layer includes a bis-azo pigment as a charge generating material and a diamine compound as a charge transferring material. The photosensitive layer may further comprise a diphenoquinone derivative. Furthermore, other additives may include a hydrazone compound and/or a fluorene compound. Preferably, the photosensitive material is set in a binding resin comprising a polycarbonate and a polyester having a specific repeat unit.

Abstract translation: 提供一种包括在导电基底上形成的光敏层的光电敏感材料。 该层的材料包括作为电荷产生材料的双偶氮颜料和作为电荷转移材料的二胺化合物。 光敏层可以进一步包含联苯醌衍生物。 此外，其他添加剂可以包括腙化合物和/或芴化合物。 优选地，感光材料设置在包含聚碳酸酯和具有特定重复单元的聚酯的粘合树脂中。