MICRO-ELECTRO MECHANICAL SYSTEM
    1.
    发明申请
    MICRO-ELECTRO MECHANICAL SYSTEM 审中-公开
    微电子机械系统

    公开(公告)号:WO2003017722A2

    公开(公告)日:2003-02-27

    申请号:PCT/US2002/022180

    申请日:2002-07-13

    Applicant: MOTOROLA, INC.

    IPC: H05B

    CPC classification number: H05K3/4092 H01H59/0009 H01H2001/0073

    Abstract: The organic MEMS according to the present invention comprises a polymeric substrate comprising a substrate surface including a first region and a second region. A polymer coating is applied to the first region to provide a coating surface that is spaced apart from the substrate surface. A terminal is disposed on the second region. A metallic trace is affixed to the coating surface such that the metallic trace forms a flexible extension over the second region. The extension has a rest position where the extension is spaced apart from the terminal, and a flexed position where the extension is disposed towards the terminal. An actuator is used to provide an electric field to deflect the extension from the rest position to the flexed position. By changing the spacing between the extension and the terminal, it is possible to change the electrical condition provided by the MEMS.

    Abstract translation: 根据本发明的有机MEMS包括聚合物基材,其包括包含第一区域和第二区域的基材表面。 将聚合物涂层施加到第一区域以提供与基底表面间隔开的涂层表面。 端子设置在第二区域上。 金属痕迹附着在涂层表面上,使得金属迹线在第二区域上形成柔性延伸。 延伸部具有静止位置,其中延伸部与端子间隔开,以及弯曲位置,其中延伸部朝向端子设置。 致动器用于提供电场以将延伸部从静止位置偏转到弯曲位置。 通过改变延伸部和端子之间的间距,可以改变由MEMS提供的电气条件。

    SEMICONDUCTOR STRUCTURES AND DEVICES FOR DETECTING CHEMICAL REACTANT
    3.
    发明申请
    SEMICONDUCTOR STRUCTURES AND DEVICES FOR DETECTING CHEMICAL REACTANT 审中-公开
    用于检测化学反应物的半导体结构和器件

    公开(公告)号:WO2003007334A2

    公开(公告)日:2003-01-23

    申请号:PCT/US2002/015082

    申请日:2002-05-13

    Applicant: MOTOROLA, INC.

    Inventor: CHASON, Marc

    IPC: H01L

    Abstract: High quality epitaxial layers of monocrystalline materials (26) can be grown overlying monocrystalline substrates (22) such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer (24) comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer (28) of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials.

    Abstract translation: 通过形成用于生长单晶层的顺应性衬底,可以将单晶材料(26)的高质量外延层生长成覆盖在单晶衬底(22)如大硅晶片上。 容纳缓冲层(24)包括通过氧化硅的非晶界面层(28)与硅晶片隔开的单晶氧化物层。 非晶界面层消耗应变并允许高质量单晶氧化物容纳缓冲层的生长。 容纳缓冲层与下面的硅晶片和上覆的单晶材料层晶格匹配。 通过非晶界面层处理容纳缓冲层和底层硅衬底之间的任何晶格失配。 此外,顺应性衬底的形成可以包括利用表面活性剂增强的外延,将单晶硅外延生长到单晶氧化物上,以及Zintl相材料的外延生长。

    UNITARY PACKAGING SYSTEM FOR A CAPACITOR AND INDUCTOR
    4.
    发明申请
    UNITARY PACKAGING SYSTEM FOR A CAPACITOR AND INDUCTOR 审中-公开
    用于电容器和电感器的单元包装系统

    公开(公告)号:WO1998001947A1

    公开(公告)日:1998-01-15

    申请号:PCT/US1997010860

    申请日:1997-07-02

    Applicant: MOTOROLA INC.

    CPC classification number: H03H7/09 H03H7/0115

    Abstract: A capacitor (14) is disposed in, for example, a ferrite shell (12). A winding (20) is formed around the shell, thereby providing an inductive component. Additional windings may be provided to form a transformer. In combining the two components into a unitary package, a space savings is realized, and assembly efficiency is increased.

    Abstract translation: 电容器(14)设置在例如铁氧体壳(12)中。 围绕壳体形成绕组(20),从而提供感应部件。 可以提供额外的绕组以形成变压器。 将两个组件组合成一体的封装,实现了节省空间,并提高了组装效率。

    MICRO-ELECTRO MECHANICAL SYSTEM AND METHOD OF MAKING

    公开(公告)号:WO2003017722A3

    公开(公告)日:2003-02-27

    申请号:PCT/US2002/022180

    申请日:2002-07-13

    Applicant: MOTOROLA, INC.

    Abstract: The organic MEMS according to the present invention comprises a polymeric substrate (12) comprising a substrate surface (16) including a first region (2) and a second region (24). A polymer coating (26) is applied to the first region to provide a coating surface that is spaced apart from the substrate surface. A terminal (18) is disposed in the second region. A metallic trace (28) is affixed to the coating surface such that the metallic trace forms a flexible extension over the second region. The extension has a rest position where the extension is spaced apart from the terminal, and a flexed position where the extension is disposed toward the terminal. An actuator (20) is used to provide an electric field to deflect the extension from the rest position to the flexed position. By changing the spacing between the extension and the terminal, it is possible to change the electrical condition provided by the MEMS.

    SEMICONDUCTOR STRUCTURES AND DEVICES FOR DETECTING CHEMICAL REACTANT

    公开(公告)号:WO2003007334A3

    公开(公告)日:2003-01-23

    申请号:PCT/US2002/015082

    申请日:2002-05-13

    Applicant: MOTOROLA, INC.

    Inventor: CHASON, Marc

    Abstract: High quality epitaxial layers of monocrystalline materials (26) can be grown overlying monocrystalline substrates (22) such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer (24) comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer (28) of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, formation of a compliant substrate may include utilizing surfactant enhanced epitaxy, epitaxial growth of single crystal silicon onto single crystal oxide, and epitaxial growth of Zintl phase materials.

    ELECTROCHEMICAL CAPACITOR AND METHOD OF MAKING SAME
    7.
    发明申请
    ELECTROCHEMICAL CAPACITOR AND METHOD OF MAKING SAME 审中-公开
    电化学电容器及其制造方法

    公开(公告)号:WO1996031893A1

    公开(公告)日:1996-10-10

    申请号:PCT/US1996004291

    申请日:1996-04-02

    Applicant: MOTOROLA INC.

    CPC classification number: H01G9/155 Y02E60/13

    Abstract: An electrochemical charge storage device (60) having two asymmetric inorganic electrodes (30, 36) is provided. The device may be fabricated using a bipolar plate which acts as both the conductor, and as the substrate upon which the active electrodes are formed. The bipolar plate may further be adapted to act as one of the active electrodes by activating a portion of the bipolar plate material.

    Abstract translation: 提供具有两个不对称无机电极(30,36)的电化学电荷存储装置(60)。 该器件可以使用双极板来制造,该双极板充当导体,并且作为形成有源电极的基板。 双极板还可以通过激活双极板材料的一部分而适于作为有源电极之一起作用。

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