公开(公告)号：US20150069259A1

公开(公告)日：2015-03-12

申请号：US14477769

申请日：2014-09-04

Applicant: Mapper Lithography IP B.V.

Inventor： Sohail Chatoor ,  Joost Witteveen ,  Alon Rosenthal ,  Johan Joost Koning

IPC: G21K1/093 ,  G21K1/087

CPC classification number: G21K1/093 ,  G21K1/087 ,  H01F2007/068 ,  H01J37/1475 ,  H01J37/3177 ,  H01J2237/1526 ,  H01J2237/31774

Abstract: The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.

Abstract translation: 本发明涉及一种用于操纵带电粒子的多个子束的轨迹的带电粒子光学装置。 所述带电粒子光学器件包括电磁偏转器，该电磁偏转器包括具有所述基底的上侧和下侧的平面基底和均匀的厚度。 基板包括：用于使所述子束通过的通孔，其中所述通孔在所述基板的上侧和下侧消失; 第一和第二线圈，其中每个所述线圈优选地是基本上螺旋形的线圈，并且包括导通布置在上侧的上引线，导电布置在下侧的下引线，以及延伸穿过所述基板的通孔，并且导电地连接 所述上引线与所述下导线之一形成所述线圈; 其中所述第一和第二线圈布置在所述通孔的任一侧上。

公开(公告)号：US09111657B2

公开(公告)日：2015-08-18

申请号：US14477769

申请日：2014-09-04

Applicant: Mapper Lithography IP B.V.

Inventor： Sohail Chatoor ,  Joost Witteveen ,  Alon Rosenthal ,  Johan Joost Koning

IPC: G21K1/08 ,  H01J37/147 ,  G21K1/093 ,  G21K1/087 ,  H01J37/317 ,  H01F7/06

CPC classification number: G21K1/093 ,  G21K1/087 ,  H01F2007/068 ,  H01J37/1475 ,  H01J37/3177 ,  H01J2237/1526 ,  H01J2237/31774

Abstract: The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.

Abstract translation: 本发明涉及一种用于操纵带电粒子的多个子束的轨迹的带电粒子光学装置。 所述带电粒子光学器件包括电磁偏转器，该电磁偏转器包括具有所述基底的上侧和下侧的平面基底和均匀的厚度。 基板包括：用于使所述子束通过的通孔，其中所述通孔在所述基板的上侧和下侧消失; 第一和第二线圈，其中每个所述线圈优选地是基本上螺旋形的线圈，并且包括导通布置在上侧的上引线，导电布置在下侧的下引线和穿过所述基板的通孔，并且导电地连接 所述上引线与所述下导线之一形成所述线圈; 其中所述第一和第二线圈布置在所述通孔的任一侧上。