公开(公告)号：US10133186B2

公开(公告)日：2018-11-20

申请号：US15299285

申请日：2016-10-20

Applicant: Mapper Lithography IP B.V.

Inventor： Bart Schipper

IPC: G03B27/58 ,  G03F7/20

Abstract: An alignment apparatus for aligning a substrate, and a substrate processing system including such alignment apparatus. The alignment apparatus includes an alignment base for supporting the substrate and/or a substrate support member. A force generating device applies a contact force on the substrate. The force generating device includes an arm including a rigid proximal end and a rigid distal end. The distal end is provided with a contact section for contacting an edge of the substrate and an elastically deformable arm section extending between the proximal and distal ends. The connection part connects the proximal end to the alignment base. The arm is movable with respect to the alignment base via the connection part. The alignment apparatus also includes an actuator for causing a displacement of the proximal end, whereby the contact force, defined by the elastically deformable arm section, is applied to the substrate by the contact section.

公开(公告)号：US08987679B2

公开(公告)日：2015-03-24

申请号：US13722873

申请日：2012-12-20

Applicant: Mapper Lithography IP B.V.

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J37/12 ,  H01J3/18

CPC classification number: H01J3/18 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/15

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。