公开(公告)号：EP2806315B1

公开(公告)日：2019-02-13

申请号：EP14169164.2

申请日：2014-05-20

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Kong, Ching Tom

IPC: G04D3/00 ,  G04B19/12

公开(公告)号：EP3133185B1

公开(公告)日：2019-10-30

申请号：EP16001369.4

申请日：2016-06-17

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Miao, Shunan ,  Kong, Ching Tom

IPC: B05D1/18 ,  C23C14/30 ,  C23C14/34 ,  C23C16/505 ,  C23C14/50 ,  A01N33/12 ,  A01N37/02 ,  A01N43/06 ,  B05D1/36 ,  B05D3/10 ,  C23C14/02 ,  C23C14/14 ,  C23C14/22 ,  A01N43/16

公开(公告)号：EP2806315A2

公开(公告)日：2014-11-26

申请号：EP14169164.2

申请日：2014-05-20

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Kong, Ching Tom

IPC: G04D3/00 ,  G04B19/12

CPC classification number: G04B19/268 ,  C23C14/35 ,  G03F7/20 ,  G03F7/26 ,  G04B19/12 ,  G04D3/0092

Abstract: A method of fabricating a component including a wafer for use in a watch includes depositing a first thin film (301) onto the wafer (300), the first thin film being adapted to allow light reflected away from the wafer to be indicative of a first colour characteristic. The first thin film (301) may include silicon nitride and have a refractive index greater than 2. The method may also include defining a pattern (12, 13) on the first thin film (301) using photolithography and processing a region within a boundary of the pattern, e.g. by depositing a metal or a ceramic material within the boundary of the pattern, so that the region allows light reflected away from the wafer (300) to be indicate of a second colour characteristic.

Abstract translation: 一种制造构件包括用于在手表中使用的晶片的方法包括，在这些晶片（300）上沉积第一薄膜（301），所述第一薄膜是angepasst以允许反射的光从晶片离开为指示第一的 色彩特性。 所述第一薄膜（301）可以包括硅氮化物和具有折射率大于2因此，该方法可以包括图案限定在第一薄膜（301）（12，13），使用光刻法和边界内的处理的区域 图案的，例如 由金属或图案的边界内的陶瓷材料上沉积，象区域允许光反射从晶片（300）要离开的第二颜色特性的指示。

公开(公告)号：EP3133185A1

公开(公告)日：2017-02-22

申请号：EP16001369.4

申请日：2016-06-17

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Miao, Shunan ,  Kong, Ching Tom

IPC: C23C14/50 ,  C23C14/30 ,  C23C14/34 ,  C23C16/458 ,  C23C16/505 ,  C23C16/503 ,  C23C16/511

Abstract: "An apparatus for coating at least a first plurality of articles each article thereof having at least a first surface to be coated is disclosed. The apparatus includes an emission source for directing emission elements towards the first surfaces of the plurality of articles, at least one support member for supporting the first plurality of articles, wherein support member supports the first plurality of articles such that the first surface is exposed to the path of emission from said emission source, and a drive assembly for moving the support member such that the first plurality of articles is moveable with respect to the path of emission from said emission source."

Abstract translation: 公开了一种用于涂覆至少第一多个制品的装置，其每个制品至少具有待涂覆的第一表面，该装置包括用于将发射元件引向多个物品的第一表面的发射源，至少一个 支撑构件，用于支撑第一多个物品，其中支撑构件支撑第一多个物品，使得第一表面暴露于来自所述发射源的发射路径;以及驱动组件，用于移动支撑构件，使得第一多个 的物品相对于来自所述排放源的排放路径是可移动的。

公开(公告)号：EP2833221A3

公开(公告)日：2015-09-02

申请号：EP14178831.5

申请日：2014-07-28

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Ching, Ho

IPC: G04B17/06 ,  G04D3/00

CPC classification number: G04B17/066 ,  G04B17/32 ,  G04B17/325 ,  G04D3/0041 ,  Y10T29/49579

Abstract: A method of producing unitary formed silicon balance spring (2) having an overcoil portion for regulation of a mechanical timepiece includes providing a silicon balance spring (2) having a main body portion (23), and an outer portion (22) for formation as an overcoil portion, wherein the outer portion (22) extends radially outward from an outermost turn of the main body portion (23) and wherein said main body portion (23) and said outer portion (22) are integrally formed from a silicon based material and are formed in a co-planar configuration. The outer portion (22) is moved in a direction relative to and out of the plane of said main body portion (23), and in a direction towards over said main body portion (23) and towards the plane of the main body portion. A stress relaxation process is provided to the balance spring so as to relieve internal stresses induced within the balance spring from the second step. After movement of said outer portion (22) into the plane of said main body portion (23), the outer portion (22) is located in an overcoil configuration relative to said main body portion.

公开(公告)号：EP2833221B1

公开(公告)日：2017-05-24

申请号：EP14178831.5

申请日：2014-07-28

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Ching, Ho

IPC: G04B17/06 ,  G04D3/00

CPC classification number: G04B17/066 ,  G04B17/32 ,  G04B17/325 ,  G04D3/0041 ,  Y10T29/49579

公开(公告)号：EP2806315A3

公开(公告)日：2016-04-13

申请号：EP14169164.2

申请日：2014-05-20

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Kong, Ching Tom

IPC: G04D3/00 ,  G04B19/12

CPC classification number: G04B19/268 ,  C23C14/35 ,  G03F7/20 ,  G03F7/26 ,  G04B19/12 ,  G04D3/0092

Abstract: A method of fabricating a component including a wafer for use in a watch includes depositing a first thin film (301) onto the wafer (300), the first thin film being adapted to allow light reflected away from the wafer to be indicative of a first colour characteristic. The first thin film (301) may include silicon nitride and have a refractive index greater than 2. The method may also include defining a pattern (12, 13) on the first thin film (301) using photolithography and processing a region within a boundary of the pattern, e.g. by depositing a metal or a ceramic material within the boundary of the pattern, so that the region allows light reflected away from the wafer (300) to be indicate of a second colour characteristic.

公开(公告)号：EP2833221A2

公开(公告)日：2015-02-04

申请号：EP14178831.5

申请日：2014-07-28

Applicant: Master Dynamic Limited

Inventor： Wang, Yingnan ,  Ching, Ho

IPC: G04B17/06 ,  G04D3/00

CPC classification number: G04B17/066 ,  G04B17/32 ,  G04B17/325 ,  G04D3/0041 ,  Y10T29/49579

Abstract: A method of producing unitary formed silicon balance spring (2) having an overcoil portion for regulation of a mechanical timepiece includes providing a silicon balance spring (2) having a main body portion (23), and an outer portion (22) for formation as an overcoil portion, wherein the outer portion (22) extends radially outward from an outermost turn of the main body portion (23) and wherein said main body portion (23) and said outer portion (22) are integrally formed from a silicon based material and are formed in a co-planar configuration. The outer portion (22) is moved in a direction relative to and out of the plane of said main body portion (23), and in a direction towards over said main body portion (23) and towards the plane of the main body portion. A stress relaxation process is provided to the balance spring so as to relieve internal stresses induced within the balance spring from the second step. After movement of said outer portion (22) into the plane of said main body portion (23), the outer portion (22) is located in an overcoil configuration relative to said main body portion.

Abstract translation: 一种制造具有用于调节机械钟表的上线圈部分的单一成形硅平衡弹簧（2）的方法包括提供具有主体部分（23）的硅平衡弹簧（2）和用于形成的外部部分（22） 一个线圈部分，其中外部部分（22）从主体部分（23）的最外侧的圆周向外延伸，并且其中所述主体部分（23）和所述外部部分（22）由硅基材料 并且形成为共面构造。 外部部分22沿着相对于主体部分23的平面的方向移动，并朝向主体部分23上方向主体部分的平面移动。 向平衡弹簧提供应力松弛过程，以便缓解来自第二步骤的平衡弹簧内部引起的内应力。 在所述外部部分（22）移动到所述主体部分（23）的平面中之后，所述外部部分（22）相对于所述主体部分位于线圈结构中。