公开(公告)号：PH12014501634A1

公开(公告)日：2014-10-13

申请号：PH12014501634

申请日：2014-07-17

Applicant: NANOGRAM CORP

Inventor： WEIDONG LI ,  ELIZABETH PENGRA-LEUNG GINA ,  UMA SRINIVASAN ,  SHIVKUMAR CHIRUVOLU ,  MASAYA SOEDA ,  GUOJUN LIU

IPC: C09D11/00 ,  C09D11/10 ,  H05K1/02

Abstract: Improved silicon/germanium nanoparticle inks are described that have silicon/ germanium nanoparticles well distributed within a stable dispersion. In particular the inks are formulated with a centrifugation step to remove contaminants as well as less well dispersed portions of the dispersion. A sonication step can be used after the centrifugation, which is observed to result in a synergistic improvement to the quality of some of the inks. The silicon/germanium ink properties can be engineered for particular deposition applications, such as spin coating or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon/germanium nanoparticles. The silicon/germanium nanoparticles are well suited for forming semiconductor components, such as components for thin film transistors or solar cell contacts.