公开(公告)号：WO2014154424A3

公开(公告)日：2014-11-13

申请号：PCT/EP2014053658

申请日：2014-02-25

Applicant: NEOCOAT SA

Inventor： RATS DAVID ,  PROVENT CHRISTOPHE

IPC: C23C16/04 ,  C23C16/27 ,  C23C16/511 ,  H01J37/32 ,  H05H1/18

CPC classification number: C23C16/274 ,  B81C1/00373 ,  C01B32/25 ,  C23C16/045 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32293 ,  H01J37/32403 ,  H01J37/32678 ,  H01J2237/327 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01L21/02115 ,  H01L21/02274

Abstract: The present invention relates to a method for depositing nanocrystalline diamond using a diamond vapor deposition facility which includes: a vacuum reactor (3) including a reaction chamber connected to a vacuum source; a plurality of plasma sources arranged along a matrix that is at least two-dimensional in the reaction chamber; and a substrate holder (5) arranged in the reactor, said method being characterized in that the deposition is carried out at a temperature of 100 to 500°C.

Abstract translation: 本发明涉及一种使用金刚石气相沉积设备沉积纳米晶金刚石的方法，该设备包括：真空反应器（3），其包括连接至真空源的反应室; 沿着在所述反应室中至少二维的矩阵布置的多个等离子体源; 和布置在反应器中的衬底保持器（5），所述方法的特征在于沉积在100-500℃的温度下进行。