公开(公告)号：JP2003133202A

公开(公告)日：2003-05-09

申请号：JP2001323421

申请日：2001-10-22

Applicant: NEW IND RES ORGANIZATION

Inventor： HATTORI TADASHI ,  UCHIUMI YUICHI ,  MEIKARI HARUTAKA

IPC: G21K1/10 ,  B81C99/00 ,  G03F1/22 ,  G03F1/68 ,  G03F7/20 ,  G21K3/00 ,  H01L21/027 ,  B81C5/00 ,  G03F1/16

Abstract: PROBLEM TO BE SOLVED: To provide an X-ray mask for processing a three-dimensional microstructure capable of forming a three-dimensional microstructure which is conical in cross section or has a round front end with one sheet of X-ray mask, and to provide a method of processing the three-dimensional microstructure using the same. SOLUTION: The X-ray mask 1 for processing a three-dimensional microstructure by X-ray lithography, wherein a cross section of the X-ray absorber 6 is of a shape other than quadrangular that does not have an uniform thickness relative to the transmission direction of the X-ray, and the three- dimensional microstructure is processed by changing the transmission strength of the X-ray to a portion to be projected of the X-ray absorber 6.

公开(公告)号：JP2003149346A

公开(公告)日：2003-05-21

申请号：JP2001350386

申请日：2001-11-15

Applicant: NEW IND RES ORGANIZATION

Inventor： HATTORI TADASHI ,  SATO KAZUMICHI

IPC: G01T1/18 ,  G01T1/20 ,  H01J31/49 ,  H01J47/06 ,  H01L27/14

Abstract: PROBLEM TO BE SOLVED: To provide a gas amplification type X-ray imaging detector allowing stable gas amplification, having a high position resolution and hardly damaged by electric discharge, and a gas amplification type X-ray imaging detecting method. SOLUTION: This gas amplification type X-ray imaging detector 1 is composed of a micro gas chamber 2 causing electron doubling and electric discharge between an anode 11 and a cathode 12 with electrons generated by the collision of radiation photon and inert gas, as seeds, and a detecting means 3 for detecting the electrons amplified by the micro gas chamber 2. The micro gas chamber 2 is formed of X-ray lithography by laminating substrates 13, 14 with a plurality of through holes 5 and conductive materials to be the anode 11 or cathode 12 on both faces, in the adjusted state of the through holes 5 and installing them on a glass substrate with a fluorescent material 15, or the fluorescent material 15 and a fluorescent material burning protective film 26 formed on the surface. The part emitting light by the collision of the electrons amplified by the micro gas chamber, against the fluorescent material is directly detected by the detecting means 3.

公开(公告)号：JP2003150071A

公开(公告)日：2003-05-21

申请号：JP2001350578

申请日：2001-11-15

Applicant: NEW IND RES ORGANIZATION

Inventor： HATTORI TADASHI

IPC: G02B5/02 ,  G02B1/11 ,  G09F9/00

Abstract: PROBLEM TO BE SOLVED: To provide a front panel board for a highly efficient display capable of being used in various displays and capable of suppressing the reduction of luminance of rays of light from illuminants. SOLUTION: This panel for a highly efficient display is provided with a board 2 becoming a first layer, a second layer which has a refractive index n2 smaller than the refractive index n1 of the first layer and which is formed alternatively with the first layer with prescribed pitches in an adjacent relation, RGB illuminants 7a, 7b, 7c which are arranged side by side on the surface of one side of the first layer and a nonreflective coated film 9 which is provided on the surface of the other side of the first layer and rays of light from the RGB illuminants 7a, 7b, 7c can be taken out from the surface of one side of the first layer without bringing about the reduction of luminance of the rays of light due to total reflection loss which is generated caused by difference in the refractive index between the first layer and the second layer.

公开(公告)号：JP2003154573A

公开(公告)日：2003-05-27

申请号：JP2001358097

申请日：2001-11-22

Applicant: NEW IND RES ORGANIZATION

Inventor： HATTORI TADASHI ,  UCHIUMI YUICHI ,  MEIKARI HARUTAKA

IPC: B29C59/02 ,  B29C59/16

Abstract: PROBLEM TO BE SOLVED: To provide a molding apparatus for emboss processing capable of molding a resin molded article having fine embossed parts on its surface, and an emboss processing molding method. SOLUTION: The molding apparatus for emboss processing 1 is equipped with a fixed mold 2, a movable mold 3 movable with respect to the fixed mold 2, heaters 4 and 5 provided to the fixed mold 2 and the movable mold 3 and ultrasonic vibrators 7 and 8 provided to either one of or both of the fixed mold 2 and the movable mold 3, the fixed mold 2 and the movable mold 3 are heated by the heaters 4 and 5 and subjected to high frequency or ultrasonic vibration by the ultrasonic vibrators 7 and 8 to perform pressurization and release operation and the cavity having fine unevenness formed between the fixed mold 2 and the movable mold 3 can be uniformly filled with a molding raw material.