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公开(公告)号：DE60218233D1
公开(公告)日：2007-03-29
申请号：DE60218233
申请日：2002-08-26
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： MIWA YOSHIHARU , KANAI TOSHIMASA
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公开(公告)号：AU2009277894B2
公开(公告)日：2014-06-05
申请号：AU2009277894
申请日：2009-06-30
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： KANAI TOSHIMASA , SAKURAI TAKESHI
Abstract: Provided is a broadband reflecting mirror that has a high reflectance in the band with wavelengths ranging from 400nm to 2,500nm, heat resistance, and flaw resistance. A broadband reflecting mirror (1) for reflecting light in a band with wavelengths ranging from 400nm to 2,500nm, is provided with a first reflecting stacked film (3) in which a first high refractive index material layer and a first low refractive index material layer are stacked alternately to reflect light with a band on a short wavelength side in the band with wavelengths ranging from 400nm to 2,500nm, a second reflecting stacked film (4) in which a second high refractive index material layer and a second low refractive index material layer are stacked alternately to reflect light with a band on a long wavelength side in the band with wavelengths ranging from 400nm to 2,500nm, wherein the broadband reflecting mirror is characterized in that the first reflecting stacked film (3) is arranged on the incident side of the light, while the second reflecting stacked film (4) is arranged at a position from which the light penetrating the first stacked film (3) can be reflected.
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公开(公告)号：DE602004024625D1
公开(公告)日：2010-01-28
申请号：DE602004024625
申请日：2004-09-24
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： SAWADA MASAHIRO , KANAI TOSHIMASA , IMAMURA TSUTOMU , ISHIHARA UKON
Abstract: A glass article which comprises a transparent heat-resistant glass sheet and a light-shielding layer on the surface thereof, wherein an average visible light transmittance at a wavelength of 380 - 780 nm of the glass article is 0.03 - 15%; and an average infrared reflectance at a wavelength of 1000 - 2500 nm of the glass article is at least 50%.
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公开(公告)号：AU2003235268A1
公开(公告)日：2003-12-02
申请号：AU2003235268
申请日：2003-05-14
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： ISHIHARA UKON , NAGATA TAKESHI , IMAMURA TSUTOMU , SHIMATANI NARUTOSHI , KANAI TOSHIMASA
Abstract: A substrate is made of a crystallized glass having translucency and an average linear thermal expansion coefficient of - 5 x 10 / DEG C at 30 to 500 DEG C. The substrate has a first surface (working surface) of a smooth surface having a surface roughness Rmax of less than 0.5 mu m, and a second surface (non-working surface) of a rough surface having a surface roughness Rmax of 4 mu m. A light shielding layer consisting of a light shielding film and an antioxidant film is formed on the second surface of the substrate through sputtering.
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公开(公告)号：AU2009277894A1
公开(公告)日：2010-02-04
申请号：AU2009277894
申请日：2009-06-30
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： KANAI TOSHIMASA , SAKURAI TAKESHI
Abstract: To provide a broadband reflecting mirror having high reflectance within a wavelength band of 400 nm to 2500 nm and having excellent thermal resistance and damage resistance. A broadband reflecting mirror 1 for reflecting light within a wavelength band of 400 nm to 2500 nm includes: a first reflective layered coating 3 for reflecting light in a short wavelength side of the wavelength band of 400 nm to 2500 nm, the first reflective layered coating including first high-refractive index material and first low-refractive index material layers alternately stacked one on another; and a second reflective layered coating 4 for reflecting light in a long wavelength side of the wavelength band of 400 nm to 2500 nm, the second reflective layered coating including second high-refractive index material and second low-refractive index material layers alternately stacked one on another, wherein the first reflective layered coating 3 is disposed on the light-incident side of the broadband reflecting mirror and the second reflective layered coating 4 is disposed at a position where light having passed through the first reflective layered coating 3 can be reflected, and wherein the first high-refractive index material layer is formed of at least one material selected from the group consisting of niobium oxide, titanium oxide, zirconium oxide, tantalum oxide, hafnium oxide, silicon nitride, yttrium oxide and indium tin oxide, the first low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride, the second high-refractive index material layer is formed of at least one material selected from the group consisting of silicon and germanium, and the second low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride.
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Patent Agency Ranking
公开(公告)号：DE60207950T2
公开(公告)日：2006-06-14
申请号：DE60207950
申请日：2002-08-26
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： MIWA YOSHIHARU , KANAI TOSHIMASA
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公开(公告)号：DE60218233T2
公开(公告)日：2007-06-14
申请号：DE60218233
申请日：2002-08-26
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： MIWA YOSHIHARU , KANAI TOSHIMASA
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公开(公告)号：DE60207950D1
公开(公告)日：2006-01-19
申请号：DE60207950
申请日：2002-08-26
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： MIWA YOSHIHARU , KANAI TOSHIMASA
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公开(公告)号：EP2320253A4
公开(公告)日：2013-06-05
申请号：EP09802639
申请日：2009-06-30
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： KANAI TOSHIMASA , SAKURAI TAKESHI
CPC classification number: F24J2/1057 , F24J2/16 , F24J2/18 , F24J2002/1071 , G02B5/0825 , Y02E10/40
Abstract: To provide a broadband reflecting mirror having high reflectance within a wavelength band of 400 nm to 2500 nm and having excellent thermal resistance and damage resistance. A broadband reflecting mirror 1 for reflecting light within a wavelength band of 400 nm to 2500 nm includes: a first reflective layered coating 3 for reflecting light in a short wavelength side of the wavelength band of 400 nm to 2500 nm, the first reflective layered coating including first high-refractive index material and first low-refractive index material layers alternately stacked one on another; and a second reflective layered coating 4 for reflecting light in a long wavelength side of the wavelength band of 400 nm to 2500 nm, the second reflective layered coating including second high-refractive index material and second low-refractive index material layers alternately stacked one on another, wherein the first reflective layered coating 3 is disposed on the light-incident side of the broadband reflecting mirror and the second reflective layered coating 4 is disposed at a position where light having passed through the first reflective layered coating 3 can be reflected, and wherein the first high-refractive index material layer is formed of at least one material selected from the group consisting of niobium oxide, titanium oxide, zirconium oxide, tantalum oxide, hafnium oxide, silicon nitride, yttrium oxide and indium tin oxide, the first low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride, the second high-refractive index material layer is formed of at least one material selected from the group consisting of silicon and germanium, and the second low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride.
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公开(公告)号：EP1505354A4
公开(公告)日：2008-10-15
申请号：EP03723356
申请日：2003-05-14
Applicant: NIPPON ELECTRIC GLASS CO
Inventor： SHIMATANI NARUTOSHI , KANAI TOSHIMASA , ISHIHARA UKON , NAGATA TAKESHI , IMAMURA TSUTOMU
CPC classification number: H05B3/74 , C03C17/06 , C03C17/3411 , C03C17/3435 , C03C17/36 , C03C17/3605 , C03C17/3626 , C03C17/42 , C03C2204/08 , C03C2217/72 , C03C2218/154 , C03C2218/36 , H05B6/1209
Abstract: A substrate consists of crystallized glass having an average linear thermal expansion coefficient at 30-500°C of -5 × 10-7/°C and translucency, the first surface (surface used) thereof being a smooth surface having a surface roughness at Rmax of less than 0.5 μm, the second surface (surface not used) thereof being a rough surface having a surface roughness at Rmax of 4 μm. The second surface of the substrate is formed, by a sputtering method, with a light shielding layer consisting of a light shielding film and an oxidization preventing film.
Abstract translation: 基板由在30-500℃下的平均线性热膨胀系数为-5×10 -7 /℃并具有透光性的结晶玻璃组成，其第一表面（使用的表面）是在R max处具有表面粗糙度的光滑表面 小于0.5μm，其第二表面（未使用的表面）是Rmax为4μm的表面粗糙度的粗糙表面。 衬底的第二表面通过溅射方法形成有由遮光膜和防氧化膜组成的遮光层。
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