Abstract:
A method and apparatus, the method comprising: forming a layer of two dimensional material (23), in particular graphene, on a first release layer; forming, possibly a (gate) insulating layer (35), and at least two, preferably three, electrodes (25); forming a second release layer overlaying at least a portion of the layer of two dimensional material; providing a mouldable polymer (24, 26, 28) overlaying the at least two electrodes and the second release layer; and removing the first and second release layers to provide a cavity (29) between the mouldable polymer (26) and the layer of two dimensional material (23).
Abstract:
A method comprising: • growing a layer of channel material (1101), preferably graphene, on a growth wafer (1112) to form a channel member, the growth wafer comprising a layer of catalyst material (1111) separated from a carrier wafer (1112) by a layer of release material (1113), the catalyst material serving as a seed layer for growing the layer of channel material; • depositing a layer of polymeric material (1102) over the formed channel member to form a supporting substrate for the layers of catalyst and channel material; • etching the layer of release material (1113) to remove the release material (1113) and carrier wafer (1112); and • patterning the layer of catalyst material (1111) to form source and drain electrodes (1116) configured to enable a flow of electrical current through the channel member.