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    Security element comprising micro and macro structure
    1.
    发明专利
    Security element comprising micro and macro structure 有权
    包含微观和宏观结构的安全元素

    公开(公告)号：JP2011008273A

    公开(公告)日：2011-01-13

    申请号：JP2010161408

    申请日：2010-07-16

    Applicant: Ovd Kinegram Ag ,  オーファオデー キネグラム アーゲー

    Inventor： STAUB RENE ,  SCHILLING ANDREAS ,  TOMPKIN WAYNE ROBERT

    IPC: G02B5/32 ,  B42D15/10 ,  B44F1/12 ,  G02B5/18

    CPC classification number: B42D25/328

    Abstract: PROBLEM TO BE SOLVED: To provide a security element difficult to copy.SOLUTION: The security element includes a layer composite which has microscopically fine, optically effective structures 9 of a surface pattern, which are embedded between two layers 5;6. The microscopically fine, optically effective structures 9 is shaped into an interface 8 between two layers 5;6 in surface parts of a holographically non-copyable security feature in a plane of the surface pattern, which is defined by co-ordinate axes x and y. The optically effective structure 9 in at least one surface part is a diffraction structure (S;S*;S**) formed by additive superimposition of a macroscopic superimposition function (M) with a microscopically fine relief profile (R). The relief profile (R), the superimposition function (M) and also the diffraction structure (S;S*;S**) are functions of the co-ordinates x and y.

    Abstract translation: 要解决的问题：提供难以复制的安全元件。解决方案：安全元件包括层复合材料，其具有嵌入在两个层5之间的表面图案的微观，光学有效的结构9。 微观上光学有效的结构9在表面图案的平面中的全息不可复制的安全特征的表面部分中的两层5和6之间形成界面8，其由坐标轴x和y 。 至少一个表面部分中的光学有效结构9是通过宏观叠加函数（M）与微观叠加轮廓（R）的叠加叠加形成的衍射结构（S; S *; S **）。 浮雕轮廓（R），叠加函数（M）以及衍射结构（S; S *; S **）是坐标x和y的函数。

    Security element and process for production of the same
    2.
    发明专利
    Security element and process for production of the same 有权
    安全要素及其生产方法

    公开(公告)号：JP2010188720A

    公开(公告)日：2010-09-02

    申请号：JP2010001531

    申请日：2010-01-06

    Applicant: Ovd Kinegram Ag ,  オーファウデー キネグラム アーゲー

    Inventor： TOMPKIN WAYNE ROBERT ,  SCHARFENBERG MICHAEL ,  BREHM LUDWIG ,  SCHILLING ANDREAS

    IPC: B42D15/10 ,  G02B5/18

    CPC classification number: B42D25/40 ,  B42D25/29 ,  B42D25/328 ,  B42D25/42 ,  B42D2033/04 ,  B42D2035/20 ,  B42D2035/24 ,  G02B5/1857 ,  G02B5/1871 ,  G02B5/32 ,  Y10T428/24612 ,  Y10T428/26

    Abstract: PROBLEM TO BE SOLVED: To provide an improved security element to safely protect a security document and the process for the manufacture of the same. SOLUTION: The invention concerns a security element 3' having a top side and an underside and a process for the manufacture thereof. The security element has a transparent layer 33' with a non-homogenous refractive index, in which a plurality of Bragg planes are formed by a refractive index variation. The transparent layer 33' is of a layer thickness of 5 to 200 μm and the transparent layer 33' has a plurality of first zones 41 of a smallest dimension of less than 300 μm, which are arranged in accordance with a first grid raster in a one-dimensional or two-dimensional succession in mutually adjacent relationship and in which the Bragg planes of the transparent layer are respectively shaped to provide a respective transmissive optical imaging function. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供改进的安全元件以安全地保护安全文件及其制造过程。 解决方案：本发明涉及一种具有顶侧和底侧的安全元件3'及其制造方法。 安全元件具有非均匀折射率的透明层33'，其中通过折射率变化形成多个布拉格平面。 透明层33'的层厚度为5〜200μm，透明层33'具有多个第一区域41，其最小尺寸小于300μm，这些第一区域41根据第一栅格光栅 相互邻接关系中的一维或二维连续，并且其中透明层的布拉格平面分别成形以提供相应的透射光学成像功能。 版权所有（C）2010，JPO＆INPIT

    MULTILAYER BODY
    3.
    发明申请
    MULTILAYER BODY 审中-公开
    复合体

    公开(公告)号：WO2011029602A3

    公开(公告)日：2011-05-05

    申请号：PCT/EP2010005552

    申请日：2010-09-09

    Applicant: OVD KINEGRAM AG ,  SCHILLING ANDREAS ,  TOMPKIN WAYNE ROBERT ,  HANSEN ACHIM

    Inventor： SCHILLING ANDREAS ,  TOMPKIN WAYNE ROBERT ,  HANSEN ACHIM

    IPC: B42D15/00 ,  G02B3/00 ,  G02B27/22 ,  G02B27/60 ,  G07D7/00

    CPC classification number: B42D25/45 ,  B42D25/21 ,  B42D25/29 ,  B42D25/324 ,  B42D25/328 ,  B42D25/342 ,  B42D2033/04 ,  B42D2033/10 ,  B42D2033/14 ,  B42D2033/18 ,  B42D2035/44 ,  G02B3/005 ,  G02B3/0056

    Abstract: The invention relates to a multilayer body (2) having a transparent first layer (13). In a first region (31) of the transparent first layer (13) a plurality of microlenses (21) are moulded, which are arranged in accordance with a microlens grid. Furthermore, the multilayer body (2) has a second layer (12) arranged beneath the first layer (13) and in a fixed position with respect to the first layer (13), the second layer having a plurality of microimages (22) which, in order to generate first optically variable information, are arranged in accordance with a microimage grid and in each case overlapping at least in areas with one of the microlenses (21) of the microlens grid. The grid widths (41, 42) of the microimage grid and the microlens grid are each less than 300 µm in at least one direction in space.

    Abstract translation: 本发明涉及一种层叠体（2），其具有透明的第一层（13）。 在第一透明层（13）包括多个微透镜（21）被成形为在其中根据微透镜网格布置的第一区域（31）。 此外，多层体（2）的第一层（13）下方，并在固定位置到第一层（13）设置在具有多个微图像（22）的第二层（12），其上至少根据一个微图像网格中，每个在 与微透镜网格的微透镜（21）的一个区域方式重叠排列，以产生第一光学可变信息。 微图像光栅和微透镜光栅的网线（41，42）是在至少一个空间方向上的每个情况下小于300微米。

    FILM ELEMENT
    4.
    发明申请
    FILM ELEMENT 审中-公开
    胶卷元件

    公开(公告)号：WO2009090091A3

    公开(公告)日：2009-12-10

    申请号：PCT/EP2009000268

    申请日：2009-01-16

    Applicant: OVD KINEGRAM AG ,  TOMPKIN WAYNE ROBERT ,  SCHILLING ANDREAS

    Inventor： TOMPKIN WAYNE ROBERT ,  SCHILLING ANDREAS

    IPC: B42D15/10

    CPC classification number: B42D25/20 ,  B42D25/328

    Abstract: The invention relates to a film element with a replicating layer (43), wherein an optically active surface structure (27) is moulded into a first surface of the replicating layer. The surface structure is formed in at least a first region of the film element (35) from a first diffractive surface relief (46) made up of a series of sequential elements (47) following a first envelope (47), wherein the elements are each made up of an element surface (48) parallel to a base surface and at least one flank adjacent to the neighbouring element surface or element surfaces, the element surfaces (48) of neighbouring elements being separated in a direction perpendicular to the base plane with a first optical separation or a multiple of said first optical separation, wherein the first optical separation is between 150 nm and 800 nm, preferably between150 nm and 400 nm. The first envelope (47) has a spatial frequency of between 100 L/mm and 2000 L/mm and an optical depth of more than 450 nm and the relief form and the spatial frequency f the envelope (47) are selected such that the incident light is refracted in one or more first directions to represent a first piece of information the colour value of which is further determined by the first optical separation.

    Abstract translation: 本发明涉及一种具有复制层（43）的膜元件，其中光学有源表面结构（27）被模制在复制层的第一表面中。 表面结构是在至少从第一衍射表面凹凸的膜元件（35）的第一区域（46）形成从多个连续的，第一包络（47）下面的元件，其中每个元件包括一个基本上平行于 由排列成一基底构件的表面（48）和至少一个垂直于底座平面邻接相邻元件的相邻元件区域或元件的表面边缘，所述元件表面（48）在一个方向上与第一光学距离或所述第一光学距离的倍数，其特征在于，隔开 第一光学距离在150nm和800nm之间，优选在150nm和400nm之间。 第一包络（47）具有100升/毫米和2000 L /毫米，大于450nm的光学深度，和凸版形式和包络的空间频率之间（47）选择为使得的空间频率在入射光 或衍射多个第一方向以显示其颜色值进一步由第一光学距离确定的第一信息。

    LIGHT-DIFFRACTING BINARY GRATING STRUCTURE
    7.
    发明申请
    LIGHT-DIFFRACTING BINARY GRATING STRUCTURE 审中-公开
    折光二元网格结构

    公开(公告)号：WO0237145A3

    公开(公告)日：2003-08-21

    申请号：PCT/EP0112679

    申请日：2001-11-02

    Applicant: OVD KINEGRAM AG ,  TOMPKIN WAYNE ROBERT ,  STAUB RENE ,  SCHILLING ANDREAS

    Inventor： TOMPKIN WAYNE ROBERT ,  STAUB RENE ,  SCHILLING ANDREAS

    IPC: G02B5/18

    CPC classification number: G02B5/18 ,  B42D25/328 ,  Y10S428/916

    Abstract: A light-diffracting binary grating structure has a microscopic mesa structure (2) whose plateaux (5) are separated by troughs (4) with an essentially rectangular cross-section, the arrangement of the troughs (4) being repeated periodically. At least N troughs separate the plates (5) within one period (T) of the mesa structure (2), N being a whole number and being greater than 2. The mesa structure (2)is an additive superposition of N phase-displaced rectangular structures which have the same period (T) of the mesa structure (2). Each of the rectangular structures has a phase displacement, so that the plates (5) of one rectangular structure fall into the troughs (4) of the N-1 other rectangular structures. Additionally, the resulting mesa structure (2) only has a single trough between two plates (5), this trough having a width that is greater than one seventh of the period (T). The binary grating structures are suitable for use in optically diffractive security elements, since such binary grating structures cannot be copied with holographic means.

    Abstract translation: 衍射二元晶格结构具有微观台面结构（2），其平台（5）由具有基本矩形横截面的谷（4）分开，谷（4）的排列周期性地重复。 在台面结构（2）的周期（T）内，至少N个谷（4）将平台（5）分开，其中N是整数且大于2。 台面结构（2）是具有台面结构（2）的相同周期（T）的N个相移矩形结构的叠加叠加。 每个矩形结构具有相移，使得一个矩形结构的平台（5）落入N-1个其他矩形结构的谷（4）中。 另外，所得到的台面结构（2）在两个平台（5）之间仅具有单个谷，其宽度大于周期（T）的七分之一。 二元晶格结构适用于光学衍射安全元件，因为二元晶格结构不能用全息手段复制。

    MULTILAYER BODY INCLUDING A DIFFRACTIVE RELIEF STRUCTURE AND METHOD FOR PRODUCING THE SAME
    9.
    发明申请
    MULTILAYER BODY INCLUDING A DIFFRACTIVE RELIEF STRUCTURE AND METHOD FOR PRODUCING THE SAME 审中-公开
    与衍射浮雕结构及其制造方法复合体，

    公开(公告)号：WO2006084686A3

    公开(公告)日：2006-12-21

    申请号：PCT/EP2006001127

    申请日：2006-02-09

    Applicant: OVD KINEGRAM AG ,  STAUB RENE ,  TOMPKIN WAYNE ROBERT ,  SCHILLING ANDREAS

    Inventor： STAUB RENE ,  TOMPKIN WAYNE ROBERT ,  SCHILLING ANDREAS

    IPC: B42D15/10 ,  B44C1/14

    CPC classification number: B32B27/08 ,  B42D25/324 ,  B42D25/328 ,  B42D25/41 ,  B42D25/42 ,  B42D2033/10 ,  B42D2033/24 ,  B44C1/14 ,  G03H1/02 ,  G03H1/0244 ,  G03H2001/0033 ,  G03H2001/188 ,  G03H2250/10

    Abstract: The invention relates to a method for producing a multilayer body (100) having a partially molded first layer (3m) and to a multilayer body produced according to said method. The method is characterized in that a diffractive first relief structure (4) is molded into a first area of a replicating layer (3) of the multilayer body, the first layer (3m) is applied to the replicating layer (3) in the first area and in a second area in which the first relief structure is not molded into the replicating layer (3), a photosensitive layer (8) is applied to the first layer (3) or a photosensitive washing mask (8) is applied as the replicating layer, the photosensitive layer or the washing mask are irradiated through the first layer (3m), thereby irradiating the photosensitive layer or washing mask (8) differently in the first and in the second area depending on the first relief structure, and the first layer (3m) is removed, while using the irradiated photosensitive layer or the washing mask (8) as the mask layer, in the first area, but not in the second area, or is removed in the second area, but not in the first area.

    Abstract translation: 描述了一种用于制造多层体（100），其具有部分成形的第一层（3M）和由此制造层叠体的方法。 它提供了一个衍射第一浮雕结构（4）在所述多层体的一个复制层（3）的第一区域的形状是，在所述第一区域，并且在第二区域中的第一层（3M）到复制层（3）， 被成形，其中第一浮雕结构是不是在复制层（3）被施加，使得感光层（8）被施加到第一层（3）或感光洗涤掩模（8）被施加作为复制层，感光 穿过所述第一层（3M）层或洗涤掩模暴露穿过其中，使得感光层或洗涤掩模（8）由引起在第一和第二区域改变第一浮雕结构露出，并且，所述第一层（3米） 使用暴露的光敏层或洗涤掩模（8），其在第一区域中的掩模层，但不是在第二区中或在第二误码率 可验证的，未在第一区域中除去。

    METHOD FOR PRODUCING A MULTILAYER BODY AND CORRESPONDING MULTILAYER BODY
    10.
    发明申请
    METHOD FOR PRODUCING A MULTILAYER BODY AND CORRESPONDING MULTILAYER BODY 审中-公开
    法生产复合材料机身，复合体

    公开(公告)号：WO2006084685A2

    公开(公告)日：2006-08-17

    申请号：PCT/EP2006001126

    申请日：2006-02-09

    Applicant: OVD KINEGRAM AG ,  STAUB RENE ,  TOMPKIN WAYNE ROBERT ,  SCHILLING ANDREAS

    Inventor： STAUB RENE ,  TOMPKIN WAYNE ROBERT ,  SCHILLING ANDREAS

    IPC: B42D15/10

    CPC classification number: B42D25/405 ,  B42D25/328 ,  Y10S359/90

    Abstract: The invention relates to a method for producing a multilayer body (100) having a partially molded first layer (3m). The method is characterized in that a diffractive first relief structure having a high depth/width ratio of the individual structure elements, especially a depth/width ratio of > 0.3, is molded into a first area (5) of a replicating layer (3) of the multilayer body and the first layer (3m) is applied with a constant surface density to the replicating layer (3) in the first area (5) and in a second area (4, 6) in which the first relief structure is not molded into the replicating layer (3), and the first layer (3m) is partially removed depending on the first relief structure, so that the first layer (3m) is partially removed in the first area (5) or in the second area (4, 6) but not in the second (46) or in the first area (5).

    Abstract translation: 本发明提供了一种用于制造多层体（100），其具有部分成形的第一层（3米），其特征在于，它提供了一个衍射首先在过程中的第一区域（5）的层叠体的复制层（3）的（100） 浮雕结构模制有各个结构元件的高深度对宽度之比，尤其是具有深度对宽度之比的> 0.3，并且所述第一层（3米），以在第一区域中的复制层（3）（5 成形），并在第二区域（4,6），其中，所述第一再没有浮雕结构在复制层（3）被施加有恒定的表面密度，并且使得由第一浮雕结构中的第一层（3M）被确定部分地去除 是这样的，在第一区域（5）或在所述第二区域中的第一层（3M）（4,6），但不是在第二区域（4,6），或在所述第一区域（5）被部分地去除。

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