中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

6 records (took 0.043 seconds)

    1.
    发明专利
    未知

    公开(公告)号：DE602004009667T2

    公开(公告)日：2008-08-28

    申请号：DE602004009667

    申请日：2004-01-21

    Applicant: PHILIPS INTELLECTUAL PROPERTY

    Inventor： RITZ ARND ,  VERGOEHL MICHAEL ,  HUNSCHE BERNO

    IPC: C03C17/245 ,  C03C17/34

    Abstract: High temperature-resistant transparent coatings based on zirconium oxide, which have improved dispersion properties and a high refractive index, comprise zirconium oxide with at least one additive from the group consisting of tantalum and/or tantalum oxide, whereby the proportion of Ta atoms, in relation to the total number of metal atoms in the coating is in the range of 5 to 30%.

    2.
    发明专利
    未知

    公开(公告)号：DE602004009667D1

    公开(公告)日：2007-12-06

    申请号：DE602004009667

    申请日：2004-01-21

    Applicant: PHILIPS INTELLECTUAL PROPERTY

    Inventor： RITZ ARND ,  VERGOEHL MICHAEL ,  HUNSCHE BERNO

    IPC: C03C17/245 ,  C03C17/34

    Abstract: High temperature-resistant transparent coatings based on zirconium oxide, which have improved dispersion properties and a high refractive index, comprise zirconium oxide with at least one additive from the group consisting of tantalum and/or tantalum oxide, whereby the proportion of Ta atoms, in relation to the total number of metal atoms in the coating is in the range of 5 to 30%.

    ELECTRIC LAMP COMPRISING LIGHT-ABSORBING LAYER
    4.
    发明申请
    ELECTRIC LAMP COMPRISING LIGHT-ABSORBING LAYER 审中-公开
    包含吸光层的电灯

    公开(公告)号：WO2008110988A3

    公开(公告)日：2009-02-05

    申请号：PCT/IB2008050880

    申请日：2008-03-11

    Applicant: PHILIPS INTELLECTUAL PROPERTY ,  KONINKL PHILIPS ELECTRONICS NV ,  HUNSCHE BERNO ,  SELL KONRAD ,  WINDE CHRISTIAN

    Inventor： HUNSCHE BERNO ,  SELL KONRAD ,  WINDE CHRISTIAN

    IPC: H01J61/40 ,  H01K1/32

    CPC classification number: H01J61/40

    Abstract: The electric lamp comprises a light-transmitting lamp vessel (1) in which a light source (2, 3) is arranged. The electric lamp comprises a light-absorbing layer (12), characterized in that the light-absorbing layer comprises sub-stoichiometric silicon oxide SiO x as a light-absorbing material, wherein 0.1 = x =1.8. The electric lamp emits yellow, amber, or red light in operation. The electric lamp may additionally comprise an optical interference filter. Preferably, the light-absorbing layer and the optical interference filter are provided by chemical or physical vapor deposition, particularly by magnetron sputtering.

    Abstract translation: 电灯包括其中布置有光源（2,3）的透光灯容器（1）。 电灯包括光吸收层（12），其特征在于，所述光吸收层包含亚化学计量氧化硅SiO x作为光吸收材料，其中0.1 = x = 1.8。 电灯在运行时发出黄色，琥珀色或红色光。 电灯可以另外包括光学干涉滤光器。 优选地，光吸收层和光学干涉滤光器通过化学或物理气相沉积提供，特别是通过磁控溅射提供。

    SPUTTERING SYSTEM
    5.
    发明申请
    SPUTTERING SYSTEM 审中-公开
    溅射系统

    公开(公告)号：WO2009027905A3

    公开(公告)日：2009-04-30

    申请号：PCT/IB2008053354

    申请日：2008-08-21

    Applicant: KONINKL PHILIPS ELECTRONICS NV ,  PHILIPS INTELLECTUAL PROPERTY ,  HENNINGER GEORG ,  HUNSCHE BERNO ,  SELL KONRAD ,  RUSKE MANFRED ,  DIEDERICH THOMAS

    Inventor： HENNINGER GEORG ,  HUNSCHE BERNO ,  SELL KONRAD ,  RUSKE MANFRED ,  DIEDERICH THOMAS

    IPC: C23C14/34 ,  H01J37/34

    CPC classification number: H01J37/3408 ,  H01J37/32678

    Abstract: The invention relates to a device (10) for sputtering at least one selected materialonto a substrate (5) and bringing about a reaction of this material, comprising a vacuum chamber (11), in which a substrate holder (12) is arranged, at least one magnetron sputtering mechanism (15), which is arranged in a workstation close to the substrate holder (12) and which has a target of the selected material which is suitable for producing a first plasma for sputtering at least one material onto the substrate (5), as well as a secondary plasma mechanism (16) for producing a secondary plasma, which is arranged in the workstation close to the magnetron sputtering mechanism (15) and close to the substrate holder (12), the sputtering mechanism (15) and the secondary plasma mechanism (16) forming a sputtering zone and an activation zone. At least two electromagnets (1, 3) and/or radiallymagnetized toric magnets as well as at least one magnetic multipole (2), which is formed from a plurality of permanent magnets, are arranged to produce magnetic fields to include the secondary plasma. The invention also relates to a method for coating a substrate, in which firstly materialis deposited on a substrate by means of a sputtering process and the deposited materialthen reacts in a plasma, which contains the necessary reactive species, to form a compound, wherein the plasma density and the degree of ionization of the plasma are increased with the aid of magnetic fields, which are produced by at least two electromagnets (1, 3) and/or radially magnetized toric magnets as well as at least one magnetic multipole (2), which is formed from a plurality of permanent magnets.

    Abstract translation: 本发明涉及一种用于将至少一种选择的材料溅射到衬底（5）上并引起该材料反应的装置（10），该装置包括真空室（11），衬底保持器（12）布置在真空室 至少一个磁控溅射机构（15），其布置在靠近衬底支架（12）的工作台中并且具有适合于产生用于将至少一种材料溅射到衬底上的第一等离子体的所选材料的靶 5）以及用于产生辅助等离子体的辅助等离子体机构（16），所述辅助等离子体机构布置在接近磁控溅射机构（15）并且靠近基板保持器（12）的工作站中，溅射机构（15） 和次级等离子体机构（16）形成溅射区和激活区。 布置至少两个电磁体（1,3）和/或径向磁化的复曲面磁体以及由多个永磁体形成的至少一个磁性多极（2）以产生包括次级等离子体的磁场。 本发明还涉及一种用于涂覆基底的方法，其中首先通过溅射工艺将材料沉积在基底上，并且沉积的材料然后在含有必要的反应性物质的等离子体中反应以形成化合物，其中等离子体 借助由至少两个电磁体（1,3）和/或径向磁化的复曲面磁体以及至少一个磁性多极（2）产生的磁场来提高等离子体的密度和电离程度， 其由多个永磁体形成。

Patent Agency Ranking