公开(公告)号：DE69921616T2

公开(公告)日：2005-09-15

申请号：DE69921616

申请日：1999-12-02

Applicant: PHILIPS INTELLECTUAL PROPERTY

Inventor： DERRA H ,  FISCHER E ,  GANSER G ,  KRUECKEN THOMAS ,  MOENCH HOLGER ,  SNIJKERS ROB

IPC: H05B41/24 ,  H05B41/282 ,  H05B41/292

Abstract: The invention is concerned with a circuit arrangement for operating a high pressure discharge lamp comprising input terminals (K1, K2) for connection to a supply voltage source, output terminals for connecting the high pressure discharge lamp, and means, coupled to the input terminals, for supplying an alternating lamp current to the high pressure discharge lamp. The lamp current has per period a mean value Im. According to the invention the lamp current in each period at its start is lowered with respect to the mean value Im so as to allow for stable diffuse attachment on the cathodic phase electrode. The circuit arrangement is in particular suited for operating a lamp in an optical projection system

公开(公告)号：DE69921616D1

公开(公告)日：2004-12-09

申请号：DE69921616

申请日：1999-12-02

Applicant: KONINKL PHILIPS ELECTRONICS NV ,  PHILIPS INTELLECTUAL PROPERTY

Inventor： DERRA H ,  FISCHER E ,  GANSER G ,  KRUECKEN THOMAS ,  MOENCH HOLGER ,  SNIJKERS ROB

IPC: H05B41/24 ,  H05B41/282 ,  H05B41/292

Abstract: The invention is concerned with a circuit arrangement for operating a high pressure discharge lamp comprising input terminals (K1, K2) for connection to a supply voltage source, output terminals for connecting the high pressure discharge lamp, and means, coupled to the input terminals, for supplying an alternating lamp current to the high pressure discharge lamp. The lamp current has per period a mean value Im. According to the invention the lamp current in each period at its start is lowered with respect to the mean value Im so as to allow for stable diffuse attachment on the cathodic phase electrode. The circuit arrangement is in particular suited for operating a lamp in an optical projection system

公开(公告)号：WO2006136967A3

公开(公告)日：2007-08-09

申请号：PCT/IB2006051814

申请日：2006-06-07

Applicant: PHILIPS INTELLECTUAL PROPERTY ,  KONINKL PHILIPS ELECTRONICS NV ,  DERRA GUENTHER HANS ,  KRUECKEN THOMAS ,  METZMACHER CHRISTOF ,  WEBER ACHIM ,  ZINK PETER

Inventor： DERRA GUENTHER HANS ,  KRUECKEN THOMAS ,  METZMACHER CHRISTOF ,  WEBER ACHIM ,  ZINK PETER

IPC: G03F7/20

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70916 ,  G03F7/70925

Abstract: The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.

Abstract translation: 本发明提供一种清洗照射单元中的光学表面以消除沉积在所述光学表面上的污染物的方法。 该方法包括清洗步骤，其中第一气体或气体混合物与所述光学表面接触，从而形成具有所述污染物的第一部分的挥发性化合物。 在清洁步骤之前的照射单元的操作暂停中，执行预处理步骤，其中第二气体或气体混合物与所述光学表面接触。 选择所述第二气体或气体混合物与不同于所述第一部分的所述污染物的第二部分反应以形成能够与所述第一气体或气体混合物形成挥发性化合物的反应产物。

公开(公告)号：WO2006134512A3

公开(公告)日：2007-03-29

申请号：PCT/IB2006051795

申请日：2006-06-06

Applicant: PHILIPS INTELLECTUAL PROPERTY ,  KONINKL PHILIPS ELECTRONICS NV ,  DERRA GUENTHER HANS ,  KRUECKEN THOMAS

Inventor： DERRA GUENTHER HANS ,  KRUECKEN THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70933

Abstract: The present invention relates to a debris mitigation system, in particular for use in a radiation unit for EUV radiation and/or X-rays. The debris mitigation system comprises a foil trap (11) having several passages allowing a straight passage of radiation and one or several feed pipes (5) for gas supply of buffer gas (7) to said foil trap. The foil trap has at least one interior space (14) extending over several of said passages, wherein the feed pipes open into that space. The present debris mitigation system allows effective debris mitigation.

Abstract translation: 本发明涉及一种碎片减轻系统，特别是用于用于EUV辐射和/或X射线的辐射单元。 碎片缓解系统包括箔捕集器（11），其具有允许辐射的直线通过的多个通道和用于向所述箔捕获器供气缓冲气体（7）的一个或多个供给管道（5）。 箔捕集器具有至少一个在几个所述通道上延伸的内部空间（14），其中进料管打开进入该空间。 目前的碎片减缓系统可以有效减少碎片。