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    Carbon materials
    2.
    发明专利
    Carbon materials 未知

    公开(公告)号：GB2585621A

    公开(公告)日：2021-01-20

    申请号：GB201815535

    申请日：2018-09-24

    Applicant: PLASMA APP LTD

    Inventor： DMITRY YARMOLICH ,  DENIS YARMOLICH ,  RAMACHANDRAN VASANT KUMAR ,  RUMEN TOMOV ,  HYUN-KYUNG KIM ,  TENG ZHAO

    IPC: H01M4/587 ,  C23C14/06 ,  C23C14/34 ,  H01G11/32 ,  H01M4/04 ,  H01M4/133 ,  H01M4/1393 ,  H01M4/66 ,  H01M10/052

    Abstract: A carbon material comprises sp2 and sp3 hybridised carbon, especially for use in an electrochemical cell, e.g. as an electrode material. An electrode comprising the carbon material is also described, the electrode preferably operating as an anode in a Li-ion battery. Preferably, the carbon material comprises at least 25 wt% sp2-type carbon and at least 2 wt% sp3-type carbon, and the carbon material has a hierarchical pore morphology. The carbon material may comprise nanocrystals, and areas of regularly arranged layers of carbon embedded in amorphous carbon. The carbon material may be doped, e.g. with 0.1 to 30 wt% of one or more dopants selected from Si, P, Fe, Cu, Li, Al, N, O, S, B, Ti, Co, Ni, Na and/or K. In a further aspect, a method of making a carbon material comprises exposing a substrate to a flux of at least 1011 carbon ions per cm2 of substrate per 1 ms, a majority of the carbon ions having a kinetic energy of at least 10 eV. The flux may be pulsed and provided by a virtual cathode deposition (VCD) process. The process may utilise a hollow cathode 101, within which a plasma is supplied, a substrate 125 and a carbon target 117.

    Virtual cathode deposition (VCD) for thin film manufacturing
    3.
    发明专利
    Virtual cathode deposition (VCD) for thin film manufacturing 未知

    公开(公告)号：GB2528141B

    公开(公告)日：2016-10-05

    申请号：GB201416497

    申请日：2014-09-18

    Applicant: PLASMA APP LTD

    Inventor： DMITRY YARMOLICH

    IPC: H01J37/077 ,  C23C14/34 ,  H01J1/02 ,  H01L21/02

    Abstract: A virtual cathode deposition apparatus utilises virtual plasma cathode for generation of high density electron beam to ablate a solid target. A high voltage electrical pulse ionizes gas to produce a plasma which temporarily appears in front of the target and serves as the virtual plasma cathode at the vicinity of target. This plasma then disappears allowing the ablated target material in a form of a plasma plume to propagate toward the substrate. Several virtual cathodes operating in parallel provide plumes that merge into a uniform plasma which when condensing on a nearby substrate leads to wide area deposition of a uniform thickness thin film.

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