公开(公告)号：PL3195344T3

公开(公告)日：2021-04-06

申请号：PL15794291

申请日：2015-09-18

Applicant: PLASMA APP LTD

Inventor： YARMOLICH DMITRY

IPC: C23C14/34 ,  H01J37/34 ,  H01J3/02 ,  H01J37/077 ,  H01J37/32

公开(公告)号：GB2528141A

公开(公告)日：2016-01-13

申请号：GB201416497

申请日：2014-09-18

Applicant: PLASMA APP LTD

Inventor： YARMOLICH DMITRY

IPC: C23C14/34 ,  H01J37/077 ,  H01J1/02 ,  H01L21/02

Abstract: A virtual cathode deposition apparatus 1 utilises a virtual plasma cathode to generate a high density electron beam to ablate a solid target 115. A hollow cathode 101 is situated between a substrate holder and a target holder 117. Plasma is supplied on the side of the target 115 to be ablated. A high voltage pulse is applied to the hollow cathode 101, in such a way that when plasma is supplied to the hollow cathode 101, a virtual cathode (vircator) is formed, which generates an electron beam, which hits the target 115 comprising deposition material, which material is ablated and a plume of said material passes through the hollow cathode 101, to form a thin layer on the substrate 125. Plasma may be supplied by a hollow cap electrode 105 and gas supply 123, the gas being provided through a slit 129 in the gas chamber 127.