Virtual cathode deposition (VCD) for thin film manufacturing

    公开(公告)号:US10047432B2

    公开(公告)日:2018-08-14

    申请号:US15512315

    申请日:2015-09-18

    Inventor: Dmitry Yarmolich

    Abstract: A virtual cathode deposition apparatus utilises virtual plasma cathode for generation of high density electron beam to ablate a solid target. A high voltage electrical pulse ionizes gas to produce a plasma which temporarily appears in front of the target and serves as the virtual plasma cathode at the vicinity of target. This plasma then disappears allowing the ablated target material in a form of a plasma plume to propagate toward the substrate. Several virtual cathodes operating in parallel provide plumes that merge into a uniform plasma which when condensing on a nearby substrate leads to wide area deposition of a uniform thickness thin film.

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