公开(公告)号：EP0512620A2

公开(公告)日：1992-11-11

申请号：EP92201211.7

申请日：1992-05-04

Applicant: Philips Electronics N.V.

Inventor： Timmers, Jacob ,  Delhez, Robbert ,  Tuinstra, Fokke

IPC: G01N23/207 ,  G01J3/02 ,  G21K1/04

CPC classification number: G01N23/20008 ,  G01J3/02 ,  G01J3/0237 ,  G01J3/0289 ,  G01N23/207 ,  G01N2223/056 ,  G01N2223/1016 ,  G01N2223/102 ,  G01N2223/305 ,  G01N2223/306 ,  G01N2223/316

Abstract: An X-ray analysis apparatus comprises a central control device which includes means for recording simulated beam paths in the apparatus, thus enabling correction for the effects of radiation-optical deviations as well as of other deviations in the apparatus or a specimen on detection signals. Such a correction facility allows for construction of an apparatus having a large number of freedoms and hence a universal application.

Abstract translation: X射线分析装置包括中央控制装置，其包括用于在装置中记录模拟光束路径的装置，从而能够校正放射 - 光学偏差的影响以及装置或样本中检测信号上的其它偏差。 这种校正装置允许构造具有大量自由度的装置，因此可以通用。

公开(公告)号：EP0512620A3

公开(公告)日：1995-07-05

申请号：EP92201211.7

申请日：1992-05-04

Applicant: Philips Electronics N.V.

Inventor： Timmers, Jacob ,  Delhez, Robbert ,  Tuinstra, Fokke

IPC: G01N23/207 ,  G01J3/02 ,  G21K1/04

CPC classification number: G01N23/20008 ,  G01J3/02 ,  G01J3/0237 ,  G01J3/0289 ,  G01N23/207 ,  G01N2223/056 ,  G01N2223/1016 ,  G01N2223/102 ,  G01N2223/305 ,  G01N2223/306 ,  G01N2223/316

Abstract: An X-ray analysis apparatus comprises a central control device which includes means for recording simulated beam paths in the apparatus, thus enabling correction for the effects of radiation-optical deviations as well as of other deviations in the apparatus or a specimen on detection signals. Such a correction facility allows for construction of an apparatus having a large number of freedoms and hence a universal application.