-
公开(公告)号:US10468151B2
公开(公告)日:2019-11-05
申请号:US15332938
申请日:2016-10-24
Applicant: PURDUE RESEARCH FOUNDATION
Inventor: Muhammad Ashraful Alam , Ruiyi Chen , Suprem R. Das , David B. Janes , Changwook Jeong , Mark Lundstrom
IPC: H01B1/02 , B82Y40/00 , B32B15/16 , G02F1/1343 , H01L31/0224 , H01L51/44 , H01L31/18 , H01B1/04 , B82Y10/00 , H01L29/16 , H01L29/41 , H01L31/028
Abstract: Hybrid transparent conducting materials are disclosed with combine a polycrystalline film and conductive nanostructures, in which the polycrystalline film is “percolation doped” with the conductive nanostructures. The polycrystalline film preferably is a single atomic layer thickness of polycrystalline graphene, and conductive nanostructures preferably are silver nanowires.
-
公开(公告)号:US11967629B2
公开(公告)日:2024-04-23
申请号:US17253180
申请日:2019-06-22
Inventor: Suprem R. Das , David B. Janes , Jiseok Kwon
CPC classification number: H01L29/435 , H01L21/02568 , H01L29/24 , H01L29/66969 , H01L29/7606
Abstract: A semiconductor device and methods of fabricating and using the same are provided. The semiconductor device comprises a channel region and at least a first, second, and third electrode. The channel region includes a compound having a transition metal and a chalcogen. The thickness of the channel region is about 3 to about 40 atomic layers.
-
公开(公告)号:US11515057B2
公开(公告)日:2022-11-29
申请号:US17062788
申请日:2020-10-05
Applicant: Purdue Research Foundation
Inventor: Muhammad Ashraful Alam , Ruiyi Chen , Suprem R. Das , David B. Janes , Changwook Jeong , Mark Lundstrom
IPC: H01B1/02 , H01B1/04 , H01L31/0224 , B82Y40/00 , G02F1/1343 , H01L31/18 , H01L51/44 , B82Y10/00 , H01L29/41 , H01L29/16 , H01L31/028
Abstract: Hybrid transparent conducting materials are disclosed which combine a polycrystalline film and conductive nanostructures, in which the polycrystalline film is “percolation doped” with the conductive nanostructures. The polycrystalline film preferably is a single atomic layer thickness of polycrystalline graphene, and the conductive nanostructures preferably are silver nanowires.
-
公开(公告)号:US20210280685A1
公开(公告)日:2021-09-09
申请号:US17253180
申请日:2019-06-22
Inventor: Suprem R. Das , David B. Janes , Jiseok Kwon
Abstract: A semiconductor device and methods of fabricating and using the same are provided. The semiconductor device comprises a channel region and at least a first, second, and third electrode. The channel region includes a compound having a transition metal and a chalcogen. The thickness of the channel region is about 3 to about 40 atomic layers.
-
-
-