公开(公告)号：US11508917B2

公开(公告)日：2022-11-22

申请号：US16904716

申请日：2020-06-18

Applicant: Purdue Research Foundation

Inventor： Shelley A. Claridge ,  Tyler Hayes ,  David McMillan

IPC: H01L51/00 ,  B05D1/20

Abstract: This invention generally relates to a method for preparing and transferring a monolayer or thin film. In particular this present invention is an improved version of the Langmuir-Schaefer technique for preparing and transferring a monolayer or thin film, incorporating in situ thermal control of the substrate during the transfer process.

公开(公告)号：US10756278B2

公开(公告)日：2020-08-25

申请号：US16038231

申请日：2018-07-18

Applicant: Purdue Research Foundation

Inventor： Shelley A. Claridge ,  Tyler Hayes ,  David McMillan

IPC: B05D1/20 ,  H01L51/00

Abstract: This invention generally relates to a method for preparing and transferring a monolayer or thin film. In particular this present invention is an improved version of the Langmuir-Schaefer technique for preparing and transferring a monolayer or thin film, incorporating in situ thermal control of the substrate during the transfer process.

公开(公告)号：US11031268B2

公开(公告)日：2021-06-08

申请号：US16038232

申请日：2018-07-18

Applicant: Purdue Research Foundation

Inventor： Shelley A. Claridge ,  Tyler Hayes ,  David McMillan

IPC: B05C13/02 ,  B05D1/20 ,  H01L21/677 ,  H01L51/00 ,  B05C3/10 ,  B05C11/02 ,  B05D1/18

Abstract: This invention generally relates to a device for preparing and transferring a monolayer or thin film. In particular this present invention is a device for preparing and transferring a monolayer or thin film to a substrate using an improved version of the Langmuir-Schaefer technique, which incorporates in situ thermal control, for instance to heat the supporting substrate before and/or during the transfer process.

公开(公告)号：US20190027697A1

公开(公告)日：2019-01-24

申请号：US16038231

申请日：2018-07-18

Applicant: Purdue Research Foundation

Inventor： Shelley A. Claridge ,  Tyler Hayes ,  David McMillan

IPC: H01L51/00 ,  B05D1/20

CPC classification number: H01L51/0075 ,  B05D1/204 ,  B05D1/208 ,  H01L51/0012 ,  H01L51/0026

Abstract: This invention generally relates to a method for preparing and transferring a monolayer or thin film. In particular this present invention is an improved version of the Langmuir-Schaefer technique for preparing and transferring a monolayer or thin film, incorporating in situ thermal control of the substrate during the transfer process.

公开(公告)号：US20200321542A1

公开(公告)日：2020-10-08

申请号：US16904716

申请日：2020-06-18

Applicant: Purdue Research Foundation

Inventor： Shelley A. Claridge ,  Tyler Hayes ,  David McMillan

IPC: H01L51/00 ,  B05D1/20

Abstract: This invention generally relates to a method for preparing and transferring a monolayer or thin film. In particular this present invention is an improved version of the Langmuir-Schaefer technique for preparing and transferring a monolayer or thin film, incorporating in situ thermal control of the substrate during the transfer process.

公开(公告)号：US20190027387A1

公开(公告)日：2019-01-24

申请号：US16038232

申请日：2018-07-18

Applicant: Purdue Research Foundation

Inventor： Shelley A. Claridge ,  Tyler Hayes ,  David McMillan

IPC: H01L21/677 ,  H01L51/00 ,  B05D1/20

Abstract: This invention generally relates to a device for preparing and transferring a monolayer or thin film. In particular this present invention is a device for preparing and transferring a monolayer or thin film to a substrate using an improved version of the Langmuir-Schaefer technique, which incorporates in situ thermal control, for instance to heat the supporting substrate before and/or during the transfer process.