公开(公告)号：JPS5439829A

公开(公告)日：1979-03-27

申请号：JP587278

申请日：1978-01-24

Applicant: RADIATION DYNAMICS

Inventor： CHIESUTAASHIITONPUSON JIYUNIA ,  SEPAATO II ORUSON ,  REIMONDO JIEI ROBII

IPC: H01T4/16 ,  H01T4/20 ,  H02H7/12 ,  H02H9/06 ,  H02M7/04 ,  H02M7/06 ,  H02M7/10

公开(公告)号：JPH01294339A

公开(公告)日：1989-11-28

申请号：JP31180788

申请日：1988-12-09

Applicant: RADIATION DYNAMICS

Inventor： CHIESUTAA SHII TONPUSON ,  REIMONDO JIEI ROBII

IPC: H01J37/06 ,  G21K5/10 ,  H01J37/147

Abstract: PURPOSE: To achieve uniform irradiation and improve the uniformity of products by providing an electromagnetic deflecting means to generate magnetic fluxes perpendicular to the plane of particle beam for deflecting and standardizing the incident angle of particles in the beam scattered by windows. CONSTITUTION: A pair of electromagnets 50, 52 generate magnetic fluxes 56, 58 to encircle scattered electron beam emitted form ordinary scanning horn windows 20, 40. When the electromagnets 50, 52 are arranged as specified, the magnetic fluxes are decreased gradually toward the center line of scannings 22, 60. The flux density given by magnetic field formers 50, 52 decreases exponentially corresponding to the distance from a ball plane, while the maximum effect is induced on the magnetic pole plane, so that electrons appearing from the scanning horn windows 20, 40 are directed toward the ends of a product for standardization and deflection. In this way, irradiation non-uniformity at the ends of a target resulting from scattered particles is improved.

公开(公告)号：JPS53149629A

公开(公告)日：1978-12-27

申请号：JP587178

申请日：1978-01-24

Applicant: RADIATION DYNAMICS

Inventor： CHIESUTAASHIITONPUSON JIYUNIA ,  SEPAATO II ORUSON ,  REIMONDO JIEI ROBII

IPC: H01T4/16 ,  H01T4/20 ,  H02H7/12 ,  H02H9/06 ,  H02M7/04 ,  H02M7/06 ,  H02M7/10