公开(公告)号：WO2007037931A3

公开(公告)日：2007-11-22

申请号：PCT/US2006034781

申请日：2006-09-08

Applicant: REVERA INC ,  SCHUELER BRUNO W ,  REED DAVID A

Inventor： SCHUELER BRUNO W ,  REED DAVID A

IPC: G01J3/42 ,  G01N21/62 ,  H01J1/50 ,  H01J40/00

CPC classification number: G01N23/2273 ,  G01N2223/085 ,  G01N2223/6116 ,  H01J2235/08

Abstract: According to one aspect of the present invention, a substrate processing system is provided. The system may include a chamber wall enclosing a chamber, a substrate support positioned within the chamber to support a substrate, an electromagnetic radiation source to emit electromagnetic radiation onto the substrate on the substrate support, the electromagnetic radiation causing photoelectrons to be emitted from a material on the substrate, an analyzer to capture the photoelectrons emitted from the substrate, and a magnetic field generator to generate a magnetic field within the chamber and guide the photoelectrons from the substrate to the analyzer.

Abstract translation: 根据本发明的一个方面，提供了一种基板处理系统。 该系统可以包括封闭室的室壁，位于腔室内以支撑衬底的衬底支撑件，用于向衬底支撑件上的衬底上发射电磁辐射的电磁辐射源，引起光电子从材料发射的电磁辐射 在基板上，分析器捕获从基板发射的光电子，以及磁场发生器，以在室内产生磁场，并将光电子从基板引导到分析器。

公开(公告)号：EP2761284A4

公开(公告)日：2015-07-22

申请号：EP12835618

申请日：2012-09-21

Applicant: REVERA INC ,  SCHUELER BRUNO W ,  REED DAVID A ,  FANTON JEFFREY THOMAS ,  SMEDT RODNEY

Inventor： SCHUELER BRUNO W ,  REED DAVID A ,  FANTON JEFFREY THOMAS ,  SMEDT RODNEY

IPC: G01N23/223 ,  G01N23/225

CPC classification number: G21K1/06 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G21K2201/062 ,  G21K2201/064

Abstract: Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy below the k-edge of silicon. A sample holder may be included for positioning a sample in a pathway of the X-ray beam. A first detector may be included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting an X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring/estimation of the primary X-ray flux at the analysis site may be provided by X-ray flux detectors near and at the analysis site. Both XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurement without the need to employ signal intensity ratios.

公开(公告)号：EP1929258A4

公开(公告)日：2014-05-28

申请号：EP06814252

申请日：2006-09-08

Applicant: REVERA INC

Inventor： SCHUELER BRUNO W ,  REED DAVID A

IPC: G01J3/42 ,  G01N21/62 ,  H01J1/50 ,  H01J40/00 ,  H01L21/67

CPC classification number: G01N23/2273 ,  G01N2223/085 ,  G01N2223/6116 ,  H01J2235/08

Abstract: According to one aspect of the present invention, a substrate processing system is provided. The system may include a chamber wall enclosing a chamber, a substrate support positioned within the chamber to support a substrate, an electromagnetic radiation source to emit electromagnetic radiation onto the substrate on the substrate support, the electromagnetic radiation causing photoelectrons to be emitted from a material on the substrate, an analyzer to capture the photoelectrons emitted from the substrate, and a magnetic field generator to generate a magnetic field within the chamber and guide the photoelectrons from the substrate to the analyzer.