公开(公告)号：US10450431B2

公开(公告)日：2019-10-22

申请号：US14904025

申请日：2014-06-11

Applicant: RIKEN TECHNOS CORPORATION

Inventor： Kohei Nakashima ,  Kazutaka Yamada ,  Hidemasa Sugimoto ,  Yoshihiro Zennyoji

IPC: B29C59/16 ,  C08J5/18 ,  B29C59/10 ,  B29C71/04 ,  B32B27/06 ,  B32B27/28 ,  B32B27/30 ,  C08J7/04 ,  C08J7/06 ,  C08J7/12 ,  B29C48/08 ,  B29C48/00 ,  B29C48/30 ,  B29C48/92 ,  B29C48/305 ,  B29C48/40 ,  B29C48/88 ,  B29K79/00 ,  B29L7/00 ,  B29C48/27

Abstract: Embodiments of the invention relate to a poly(meth)acrylimide film and a method for manufacturing such a film. At least one embodiment provides a poly(meth)acrylimide film that has (i) a total light transmittance of over 90% and (ii) haze of 2.0% or less. This film preferably has retardation of less than 50 nm. The method for manufacturing this film includes the following steps: (A) using a device provided with an extruder and a T die, a poly(meth)acrylimide molten film is continuously extruded from the T die; and (B) the poly(meth)acrylimide molten film is loaded by being fed between a rotating or circulating first mirrored-surface body and a rotating or circulating second mirrored-surface body, and then the film is pressed. During these steps, (C) the surface temperature of the first mirrored-surface body is in the range 100-200° C., and (D) the surface temperature of the second mirrored-surface body is in the range 20-200° C.