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公开(公告)号：SG11201805283UA
公开(公告)日：2018-07-30
申请号：SG11201805283U
申请日：2016-12-23
Applicant: RUDOLPH TECHNOLOGIES INC
Inventor： FITZGERALD WAYNE
IPC: H01L21/78 , H01L21/02 , H01L21/76 , H01L21/764
Abstract: A method for monitoring and controlling a substrate singulation process is described. Device edges are imaged and identified for analysis. Discrepancies in device edges are noted and used to modify a singulation process and to monitor the operation of singulation processes for anomalous behavior.
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