Transitional alumina particulate materials having controlled morphology and processing for forming same

    公开(公告)号:ZA200703961B

    公开(公告)日:2008-06-25

    申请号:ZA200703961

    申请日:2007-05-16

    Abstract: Methods and structures for optical masks that have a liner on the trench sidewalls. An example embodiment comprises a mask structure for use with light at a wavelength comprising: a substrate having a first region, a second region and a third region; a first trench in the first region; a first region having a first thickness of a first material, the first material having a first amount of transmission of light at the wavelength, the second region having a second thickness of the first material, such that the second thickness is greater than the first thickness by a first difference, the first difference being equivalent to a phase shift of 180 degrees at the wavelength, and a third region located on the substrate, the third region having a third thickness of the first material, such that the third thickness is equal to or greater than the second thickness; a liner on the sidewalls of the trench. The liner reduces the reflections from the trench sidewall. The embodiments can be used with single and double phase shift masks and with chromeless phase lithography masks.

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