公开(公告)号：US20230068823A1

公开(公告)日：2023-03-02

申请号：US17708217

申请日：2022-03-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Uihyoung LEE ,  Suji GIM ,  Hongsik PARK ,  Taeheon LEE

IPC: B01D53/76 ,  B01D53/38 ,  B01D45/16 ,  B04C5/185 ,  B04C5/085 ,  B04C9/00 ,  B04C5/15 ,  H01J37/32 ,  H01L21/67

Abstract: An apparatus for trapping an exhaust material from a substrate-processing process includes: a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust material is discharged from the substrate-processing process using a reaction gas; an atomization module for providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction, and a collector configured to collect the powder.