公开(公告)号：US20160322241A1

公开(公告)日：2016-11-03

申请号：US15141946

申请日：2016-04-29

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Jun MATSUSHITA ,  Takashi MIYAMOTO ,  Konosuke HAYASHI ,  Osamu YAMAZAKI

IPC: H01L21/67 ,  F26B3/30 ,  H01L21/687

CPC classification number: F26B3/30 ,  F26B5/08 ,  H01L21/67115

Abstract: The substrate processing unit 1 comprises the rotating table 31 configured to hold substrate W, the processing chamber 37 which accommodates the rotating table 31, a lamp 61 is provided above the processing chamber 37 and configured to heat the surface of substrate W, the lamp chamber 60 which accommodates that lamp 61, a transmission window 62 disposed below the lamp chamber 60, and a plurality of nozzle 64 which supply cooling fluid G to the transmission window 62. Then the substrate processing unit 1 can suppress generating of a water mark or pattern collapse, and can perform good substrate processing.

Abstract translation: 基板处理单元1包括被配置为保持基板W的旋转台31，容纳旋转台31的处理室37，在处理室37的上方设置有灯61，其构造为加热基板W的表面，灯室 60，其容纳该灯61，设置在灯室60下方的透射窗62以及将冷却流体G供给到透射窗62的多个喷嘴64.然后，基板处理单元1可以抑制水印或图案的产生 崩溃，并可以执行良好的基板处理。