公开(公告)号：US20170211180A1

公开(公告)日：2017-07-27

申请号：US15004455

申请日：2016-01-22

Applicant: SILCOTEK CORP.

Inventor： Thomas F. VEZZA ,  Steven A. CONDO ,  Nicholas Peter DESKEVICH ,  James B. MATTZELA ,  Paul H. SILVIS

IPC: C23C16/455 ,  C23C16/46

CPC classification number: C23C16/455 ,  C23C16/24 ,  C23C16/45502 ,  C23C16/46

Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.