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1.发明公开APPARATUS AND METHODS FOR UNIFORMLY FORMING POROUS SEMICONDUCTOR ON A SUBSTRATE 有权装置及其制造方法均匀的多孔SEMICONDUCTORS在基底上
公开(公告)号：EP2652774A4
公开(公告)日：2016-04-27
申请号：EP11876396
申请日：2011-11-03
Applicant: SOLEXEL INC
Inventor： KRAMER KARL-JOSEF , MOSLEHI MEHRDAD M , TAMILMANI SUBRAMANIAN , KAMIAN GEORGE , ASH-JAEE JAY , YONEHARA TAKAO
IPC: H01L21/306 , C25F3/12 , C25F7/00 , H01L21/02
CPC classification number: B81C99/0025 , B81C2201/0115 , C25D11/005 , C25D11/32 , C25D17/001 , C25D17/06 , C25F3/12 , C25F7/00 , H01L21/306 , H01L31/0284 , H01L31/18
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