Abstract:
PROBLEM TO BE SOLVED: To provide an illumination device that reduces steep luminance variation in a boundary part between adjacent divided areas without increasing a load on a drive system, and to provide a display device using the same and electronic equipment. SOLUTION: Since each center of a lens 52b is provided so as to be deviated outward more than each light source 51b with respect to a central point 11 of an unit region 15, light distribution of each light source 51 is deviated to the outside of the unit region 15. Accordingly, the luminous flux by the entire light source unit 5b is widened outside of the unit region 15. The luminous flux by the entire widened light source unit 5b is superposed on the luminous flux by the entire light source unit 5b in the unit region 15 adjacent to the unit regions 15 involved in a backlight 2. As a result, the steep luminance variation in the boundary part between the unit region 15 and the unit regions 15 adjacent thereto can be reduced without increasing the load on the drive system. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To manufacture a predetermined wiring board having a multi-layer structure by suppressing the new occurrence of electric leak. SOLUTION: This method for manufacturing a wiring board comprises a wiring pattern formation process; a position/area inspection process for detecting the plane position and area of a defect; and a procedure selection process for selecting a correction procedure based on the rate of the plane areas of the defect and any of conductive members overlapped with the defect. In this procedure selection process, only when the rate of the plan areas is a reference value or less, the correction procedure for removing any defect by emitting a short pulse width laser beam whose pulse width is 10 pico seconds or less is selected so that a wiring board can be manufactured. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a planar light source device suitable for mass production, hardly generating defects at production, having a structure hardly generating unevenness of shape at mass production, capable of aiming at reduction of size and thickness, and capable of easily carrying out partial brightness modulation. SOLUTION: The planar light source device is provided with a substrate 10, a plurality of light-emitting elements 20, and a covering member 30 covering the plurality of light-emitting elements and the substrate 10. At an apex face of the covering member 30, a round-shaped first apex face area 34 is formed into a rotation-symmetrical curved surface recessed toward the substrate 10 with a normal line as a rotation axis, and a second apex face area 35 at apex face as excluding the first apex face area 34 is flat on the whole. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method which can stably restore conductive films such as interconnect lines in semiconductor devices such as display devices. SOLUTION: The processing is carried out by a joint process in which a first and a second conductive film 10 and 11 separated mutually among a large number of conductive films prepared on a substrate 3 are respectively jointed with a third conductive film 14 by adhesion of a first and a second connecting member 12 and 13, and by an elimination process which eliminates at least a part of the third conductive film leaving a coupling member 15 from the first connecting member 12 down to the second connecting member 13. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an organic electroluminescent element allowing efficient formation of stacked layers of organic and inorganic films, and a plasma treatment apparatus used for the same. SOLUTION: Upon introduction of Ar and methyl methacrylate into a treatment chamber 31, a high frequency power of 100 W is applied to a target 20 by a high frequency power supply 35. A stress releasing layer of polymethyl methacrylate is thereby formed on a substrate 10 for film formation. When the formation of the stress releasing layer is completed, the amount of introduction of methyl methacrylate into the treatment chamber 31 is gradually decreased while N 2 is introduced into the treatment chamber 31 and the amount of introduction thereof is gradually increased. At the same time, the high frequency power is switched from 100 W to 1000 W, and this high frequency power of 1000 W is applied to the target 20 of Si. A gas barrier layer of Si 3 N 4 is thereby formed on the stress releasing layer. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide an electroluminescent element that prevents deterioration by water or oxygen and is capable of improving reliability, and its manufacturing method. SOLUTION: The element part 10 on the substrate is covered by a barrier layer 20 at its surface. The barrier layer 20 seals the element part 10 and an organic layer P and an inorganic layer I are laminated alternately so as to shut off infiltration of water and oxygen. The inorganic layer I performs the function of mainly preventing transmission of water and oxygen and the organic layer P has sufficient elasticity and performs the function of suppressing stress by being provided between the inorganic layers I so that the inorganic layers I may not contact each other. When the barrier layer 20 is made multi-layered by thinning the thickness of one layer, the occurrence of cracks is prevented and the barrier performance is improved and flexibility for enduring deformation such as bending is provided. These organic layer P and inorganic layer I are formed by the vacuum dry process such as vacuum evaporation. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To solve the problem that, in a film forming method generating a plasma, when forming a gradient refractive index film having the index varying in a film thickness direction by changing a film forming condition, the change of this condition is limited within an extremely narrow range because the plasma becomes unstable, thus lowering the reproducibility of film forming. SOLUTION: This method for forming a thin film on a substrate 51 by a catalytic deposition method includes changing one or plural film forming conditions at film forming to form the gradient refractive index film in which the refractive index varies in its thickness direction.
Abstract:
PROBLEM TO BE SOLVED: To easily perform miniaturization. SOLUTION: Plural bare chip components 1 are arranged so as to make a circuit surface 1a form one surface and sealed by an insulation material 3 so as to expose only an electrode part, and plural wiring layers 5 are laminated and formed through an insulation layer 4 on the side of the circuit surface 1a. Also, it is preferable to form the insulation layer 4 by photosensitive resin, form the insulation layer 4 on the circuit surface 1a of the bare chip components 1, laminate and form the plural wiring layers 5 through the insulation layer 4 on it, form a through-hole 7 which is a hole part for which a conductive material is disposed inside of the prescribed position of the insulation layer 4 and electrically connect the electrode part, the wiring layers 5 and the wiring layers 5 with each other. Also, a metal plate 8 in contact with a main surface 1b on the opposite side of the circuit surface 1a of the bare chip components 1 can be disposed as a heat radiation means. Or, a cover member for covering the insulation material 3 is provided, and a part of the cover member can be brought into contact with the main surface 1b on the opposite side of the circuit surface 1a of the bare chip components 1 and turned to the heat radiation means.
Abstract:
PROBLEM TO BE SOLVED: To expand the area of a target to be eroded caused by plasma and to improve its using efficiency, in a sputtering system, by continuously changing the positions of magnets for generating the magnetic fields as the ones for converging plasma relatively to the target. SOLUTION: In a magnetic field converging type magnetron sputtering system, inside and outside magnets 12 and 13 for generating the magnetic fields for converging plasma are arranged on the center part and outside part of a ring shaped target 11. In the inside magnet 12, its magnetic flux density is smaller than that of the outside magnet 13, and it is reciprocated up and down in the thickness direction to the target 11. By this movement up and down, the magnetic lines of force 15A and 15B change their positions, and the position in which the vertical components of magnetic fluxes for converging plasma on the surface of the target 11 reaches zero fluctuates, so that the fact that the surface of the target is partially eroded in a concentrated state is prevented, and it is uniformly eroded to improve the efficiency of using the target 11.