公开(公告)号：AU7013594A

公开(公告)日：1995-05-29

申请号：AU7013594

申请日：1994-02-16

Applicant: SOUTHWALL TECHNOLOGIES INC

Inventor： GRIMES CRAIG A ,  CORMIA ROBERT L

IPC: H01F41/34 ,  H01F10/08 ,  B32B7/06 ,  G08B13/24

Abstract: A method of patterning magnetic material so as to achieve desired magnetic properties includes providing a metallic substrate having an array of raised islands spaced apart by depressed regions in a pattern to define geometries of magnetic devices. In one embodiment, heating the metallic substrate yields magnetic films that possess improved properties with respect to coercive force, anisotrophy field, permeability, and saturation magnetization of both magnetically hard and magnetically soft materials. In another embodiment, a release layer having a low adhesion with respect to attachment to the metallic substrate or a non-metallic substrate is deposited prior to formation of multilayer stacks, thereby reducing the risk of splitting such a stack. In yet another embodiment, the magnetic devices are formed in the depressed regions, rather than on the raised islands.