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    SCRUBBER FOR REACTIVE GASSES
    1.
    发明申请
    SCRUBBER FOR REACTIVE GASSES 审中-公开
    用于反应性通道的SCRUBBER

    公开(公告)号：WO2009029876A4

    公开(公告)日：2009-06-25

    申请号：PCT/US2008074900

    申请日：2008-08-29

    Applicant: SPECTRASENSORS INC ,  BAUM MARC M ,  MOSS JOHN ,  FEITISCH ALFRED ,  ZHOU XIN ,  LIU XIANG ,  KWAN ALEX

    Inventor： BAUM MARC M ,  MOSS JOHN ,  FEITISCH ALFRED ,  ZHOU XIN ,  LIU XIANG ,  KWAN ALEX

    IPC: B01D53/52 ,  B01D53/58 ,  B01D53/68 ,  G01N30/02

    CPC classification number: B01D53/685 ,  B01D53/42 ,  B01D53/52 ,  B01D53/58 ,  B01D2251/512 ,  B01D2251/602 ,  B01D2251/606 ,  B01D2259/40

    Abstract: Scrubber media for reactive gases, that can include but are not necessarily limited to hydrogen chloride (HCl), hydrogen sulfide (H2S), hydrogen fluoride (HF), and ammonia (NH3), can include reactive particles, potentially as small as nano-scale, that can optionally be suspended on macro-scale carrier particles. Reactive gases can be converted to non-volatile compounds by being passed through a bed of such scrubber media. Such scrubber media can be used to remove reactive gases from gas mixtures. Potential applications include differential absorption spectroscopy, air pollutant emission controls, and the like. Methods of preparing scrubber media are also described.

    Abstract translation: 可以包括但不限于氯化氢（HCl），硫化氢（H 2 S），氟化氢（HF）和氨（NH 3））的反应性气体的洗涤介质可以包括可能小至纳米级的反应性颗粒， 可以任选地悬浮在大规模载体颗粒上。 反应性气体可以通过穿过这种洗涤介质的床而转化为不挥发性化合物。 这种洗涤介质可用于从气体混合物中除去反应性气体。 潜在应用包括差示吸收光谱，空气污染物排放控制等。 还描述了制备洗涤介质的方法。

    REACTIVE GAS DETECTION IN COMPLEX BACKGROUNDS
    2.
    发明申请
    REACTIVE GAS DETECTION IN COMPLEX BACKGROUNDS 审中-公开
    复杂背景下的活性气体检测

    公开(公告)号：WO2008128114B1

    公开(公告)日：2008-12-18

    申请号：PCT/US2008060128

    申请日：2008-04-11

    Applicant: SPECTRASENSORS INC ,  ZHOU XIN ,  LIU XIANG ,  FEITISCH ALFRED ,  SANGER GREGORY M

    Inventor： ZHOU XIN ,  LIU XIANG ,  FEITISCH ALFRED ,  SANGER GREGORY M

    IPC: G01N21/35

    CPC classification number: G01N21/3504 ,  G01N2021/3545 ,  G01N2021/399 ,  G01N2201/1215

    Abstract: A differential absorption spectrum for a reactive gas in a gas mixture can be generated for sample absorption data by subtracting background absorption data set from the sample absorption data. The background absorption data can be characteristic of absorption characteristics of the background composition in a laser light scan range that includes a target wavelength. The differential absorption spectrum can be converted to a measured concentration of the reactive gas using calibration data. A determination can be made whether the background composition has substantially changed relative to the background absorption data, and new background absorption data can be used if the background composition has substantially changed. Related systems, apparatus, methods, and/or articles are also described..

    Abstract translation: 通过从样品吸收数据中减去背景吸收数据，可以为样品吸收数据产生气体混合物中反应气体的差分吸收光谱。 背景吸收数据可以是包括目标波长的激光扫描范围中的背景组分的吸收特性的特征。 差分吸收光谱可以使用校准数据转换为测量的反应气体浓度。 可以确定背景组成是否相对于背景吸收数据有实质性改变，并且如果背景组成已经基本改变，则可以使用新的背景吸收数据。 还描述了相关的系统，设备，方法和/或物品。

    SCRUBBER FOR REACTIVE GASSES
    5.
    发明申请
    SCRUBBER FOR REACTIVE GASSES 审中-公开
    活性气体洗涤器

    公开(公告)号：WO2009029876A3

    公开(公告)日：2009-04-23

    申请号：PCT/US2008074900

    申请日：2008-08-29

    Applicant: SPECTRASENSORS INC ,  BAUM MARC M ,  MOSS JOHN ,  FEITISCH ALFRED ,  ZHOU XIN ,  LIU XIANG ,  KWAN ALEX

    Inventor： BAUM MARC M ,  MOSS JOHN ,  FEITISCH ALFRED ,  ZHOU XIN ,  LIU XIANG ,  KWAN ALEX

    IPC: B01D53/52 ,  B01D53/58 ,  B01D53/68 ,  G01N30/02

    CPC classification number: B01D53/685 ,  B01D53/42 ,  B01D53/52 ,  B01D53/58 ,  B01D2251/512 ,  B01D2251/602 ,  B01D2251/606 ,  B01D2259/40

    Abstract: Scrubber media for reactive gases, that can include but are not necessarily limited to hydrogen chloride (HCl), hydrogen sulfide (H2S), hydrogen fluoride (HF), and ammonia (NH3), can include reactive particles, potentially as small as nano-scale, that can optionally be suspended on macro-scale carrier particles. Reactive gases can be converted to non-volatile compounds by being passed through a bed of such scrubber media. Such scrubber media can be used to remove reactive gases from gas mixtures. Potential applications include differential absorption spectroscopy, air pollutant emission controls, and the like. Methods of preparing scrubber media are also described.

    Abstract translation: 可以包括但不一定限于氯化氢（HCl），硫化氢（H 2 S），氟化氢（HF）和氨（NH 3）的反应气体的洗涤器介质可以包括反应性颗粒， 可以选择性地悬挂在宏观尺度的载体颗粒上。 反应性气体可以通过穿过这种洗涤器介质床而转化为非挥发性化合物。 这种洗涤器介质可以用来从气体混合物中除去反应气体。 潜在的应用包括差示吸收光谱，空气污染物排放控制等。 还描述了制备洗涤器介质的方法。

    BACKGROUND COMPENSATION BY MULTIPLE-PEAK MEASUREMENTS FOR ABSORPTION SPECTROSCOPY-BASED GAS SENSING
    6.
    发明申请
    BACKGROUND COMPENSATION BY MULTIPLE-PEAK MEASUREMENTS FOR ABSORPTION SPECTROSCOPY-BASED GAS SENSING 审中-公开
    用于吸收基于光谱的气体感测的多峰度测量的背景补偿

    公开(公告)号：WO2008130727A2

    公开(公告)日：2008-10-30

    申请号：PCT/US2008051931

    申请日：2008-01-24

    Applicant: SPECTRASENSORS INC ,  LIU XIANG ,  ZHOU XIN ,  FEITISCH ALFRED ,  SANGER GREGORY M

    Inventor： LIU XIANG ,  ZHOU XIN ,  FEITISCH ALFRED ,  SANGER GREGORY M

    IPC: G01N21/35

    CPC classification number: G01N21/3504 ,  G01N21/274 ,  G01N21/314 ,  G01N21/39 ,  G01N2201/1215

    Abstract: Concentrations of a target analyte in a gas mixture containing one or more background analytes having potentially interfering spectral absorption features can be calculated by compensating for background analyte absorption at a target wavelength used to quantify the target analyte. Absorption can be measured at a reference wavelength chosen to quantify the concentration of the background analyte. Using a background gas adjustment factor or function, the absorption measured at the reference wavelength can be used to calculate absorption due to the background analyte at the target wavelength and thereby compensate for this background absorption to more accurately calculate the target analyte concentration in real or near real time. Additional background analytes can optionally be compensated for by using one or more additional reference wavelengths.

    Abstract translation: 含有具有潜在干扰光谱吸收特征的一种或多种背景分析物的气体混合物中的目标分析物的浓度可以通过补偿用于量化目标分析物的目标波长的背景分析物吸收来计算。 可以在选择的参考波长处测量吸光度，以量化背景分析物的浓度。 使用背景气体调节因子或功能，可以使用在参考波长处测量的吸收来计算由于目标波长的背景分析物引起的吸收，从而补偿该背景吸收，以更精确地计算实际或近似的目标分析物浓度 即时的。 可以通过使用一个或多个另外的参考波长来可选地补偿附加的背景分析物。

    DETECTION OF MOISTURE IN REFRIGERANTS
    7.
    发明申请
    DETECTION OF MOISTURE IN REFRIGERANTS 审中-公开
    检测制冷剂中的水分

    公开(公告)号：WO2008048994A2

    公开(公告)日：2008-04-24

    申请号：PCT/US2007081617

    申请日：2007-10-17

    Applicant: SPECTRASENSORS INC ,  ZHOU XIN ,  LIU XIANG ,  SANGER GREGORY M

    Inventor： ZHOU XIN ,  LIU XIANG ,  SANGER GREGORY M

    IPC: G01N21/35 ,  G01N21/39

    CPC classification number: G01N21/3504 ,  G01N21/031 ,  G01N21/3554 ,  G01N21/39

    Abstract: Moisture can be detected in a refrigerant background such as HFC (Hydroflurocarbon) HFC-134A and HFC-152A and exampled by HFC-23, HFC-32, HFC-143A, HFC-125, HFC-245FA, HFC-227EA, and the like. The system can include a light source operating at any one of several wavelengths within the water absorption bands at wavelengths such as 1.4, 1.9 and 2.7 µm and a detector that measures the transmitted light intensity through the HFC samples. In one variation, the light source is a tunable diode laser and the moisture level is determined by direct absorption and harmonic spectroscopy. Related techniques, apparatus, systems, and articles are also described.

    Abstract translation: 可以在制冷剂背景下检测出水分，例如HFC（Hydroflurocarbon）HFC-134A和HFC-152A，并用HFC-23，HFC-32，HFC-143A，HFC-125，HFC-245FA，HFC-227EA和 喜欢。 该系统可以包括在诸如1.4,1.9和2.7μm的波长的范围内在吸水带内的几个波长中的任何一个处操作的光源和测量通过HFC样品的透射光强度的检测器。 在一个变化中，光源是可调谐二极管激光器，并且通过直接吸收和谐波光谱测定水分含量。 还描述了相关技术，装置，系统和制品。

    SPECTROMETER WITH VALIDATION CELL
    8.
    发明专利
    SPECTROMETER WITH VALIDATION CELL 未知

    公开(公告)号：CA2815323C

    公开(公告)日：2017-06-13

    申请号：CA2815323

    申请日：2011-02-15

    Applicant: SPECTRASENSORS INC

    Inventor： FEITISCH ALFRED ,  KELLER LUTZ ,  LIU XIANG ,  SCHREMPEL MATHIAS ,  HELBLEY KEITH BENJAMIN

    IPC: G01J3/02

    Abstract: A valid state of an analytical system that includes a light source (102) and a detector (106) can be verified by determining that deviation of first light intensity data quantifying a first intensity of light received at the detector from the light source after the light has passed at least once through each of a reference gas in a validation cell (114) and a zero gas from a stored data set does not exceed a pre-defined threshold deviation. The stored data set can represent at least one previous measurement collected during a previous instrument validation process performed on the analytical system. The reference gas can include a known amount of an analyte. A concentration of the analyte in a sample gas in a measurement cell (112) can be determined by correcting second light intensity data quantifying a second intensity of the light received at the detector after the light passes at least once through each of the reference gas in the validation cell and a sample gas containing an unknown concentration of the analyte compound. Related systems, methods, and articles of manufacture are also described.

    Spectrometer with variable beam power and shape
    10.
    发明专利
    Spectrometer with variable beam power and shape 未知

    公开(公告)号：AU2015303971A1

    公开(公告)日：2017-02-16

    申请号：AU2015303971

    申请日：2015-07-09

    Applicant: SPECTRASENSORS INC

    Inventor： FEITISCH ALFRED ,  LIU XIANG ,  CHANG CHIH-HUSAN ,  HUANG HSU-HUNG

    IPC: G01J3/42

    Abstract: At least one light source is configured to emit at least one beam into a sample volume of an absorbing medium. In addition, at least one detector is positioned to detect at least a portion of the beam emitted by the at least one light source. Further, at least one beam modification element is positioned between the at least one detector and the at least one light source to selectively change at least one of (i) a power intensity of, or (ii) a shape of the beam emitted by the at least one light source as detected by the at least one detector. A control circuit is coupled to the beam modification element. Related apparatus methods, articles of manufacture, systems, and the like are described.

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