PROCESS AND DEVICE FOR LACQUERING OR COATING A SUBSTRATE
    1.
    发明申请
    PROCESS AND DEVICE FOR LACQUERING OR COATING A SUBSTRATE 审中-公开
    方法和设备上漆或涂覆衬底

    公开(公告)号:WO1996019295A1

    公开(公告)日:1996-06-27

    申请号:PCT/EP1995000905

    申请日:1995-03-11

    CPC classification number: H01L21/6715 B05C9/02

    Abstract: The invention pertains to a device for lacquering or coating a substrate (29) using a component (12) with a capillary gap (13, 14), having a container (10) filled with lacquer or coating liquid, the component (12) being disposed within the container (10) so that the capillary gap (13, 14) is immersed in the lacquer or coating liquid and the lacquer or coating liquid feeds into the capillary gap (13, 14) from the container (10), and having means (44) for moving the outlet (40) of the capillary gap (13, 14) relative to the container (10) in the vertical direction (28).

    Abstract translation: 它是用于通过毛细间隙(13,14)具有部件(12)的装置涂漆或涂覆衬底(29)中,用填充有油漆或涂料液体容器(10)的容器,其中,所述部件(12),所以装置 被布置成使得所述毛细管间隙(13,14)被浸入从容器(10)到所述毛细间隙(13,14)中的涂料或涂布液和涂料或涂层液体可以被供给,并且装置(44),用于移动 的毛细间隙的出口开口(40)(13,14)相对于在高度方向上的容器(10)(28)。

Patent Agency Ranking