Apparatus and methods relating to reduced photoelectron yield and/or secondary electron yield

    公开(公告)号:GB2527291A

    公开(公告)日:2015-12-23

    申请号:GB201410593

    申请日:2014-06-13

    Abstract: A method of reducing the photoelectron yield (PEY) and/or the secondary electron yield (SEY) of at least part of an apparatus, the method comprising the steps of providing an apparatus, and ablating material from a metal surface of the apparatus using a pulsed laser to produce an array of periodic structures in the metal surface and thereby reducing the PEY and/or SEY of the metal surface. The apparatus is shown to be a vacuum chamber, a particle accelerator, a radio frequency waveguide, a detector and a spacecraft. Also shown is a method performed in the presence of a reactive gas such that the metal surface is caused to react with the reactive gas.

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