Abstract:
A semiconductor electronic device (1) is disclosed, which comprises a die (2) of semiconductor material and a support (3), the die (2) of semiconductor material including an integrated electronic circuit and a plurality of contact pads (6) associated with the electronic circuit and connected electrically to the support (3) by wire leads (4), each contact pad of said plurality of contact pads (6) comprising a lower layer (7) of copper, or alloys thereof; and an upper layer. Advantageously, the upper layer consists of: a first film (9) of nickel or alloys thereof, overlying the lower layer (7) of copper or alloys thereof; and a second film (10) of gold or alloys thereof, overlying the first film (9) of nickel or alloys thereof. Moreover, the layer (7) or film (9, 10) are deposited by an electroless chemical process.
Abstract:
A semiconductor electronic device (1) is disclosed, which comprises a die (2) of semiconductor material and a support (3), the die (2) of semiconductor material including an integrated electronic circuit and a plurality of contact pads (6) associated with the electronic circuit and connected electrically to the support (3) by wire leads (4), characterized in that each contact pad of said plurality of contact pads (6) comprising a lower layer (7) of copper, or alloys thereof; and an upper layer. Advantageously, the upper layer consists of: a first film (9) of palladium or alloys thereof, overlying the lower layer (7) of copper or alloys thereof; and optionally a second film (10) of gold or alloys thereof, overlying the first film (9) of palladium or alloys thereof. Moreover, the layer (7) or film (9, 10) are deposited by an electroless chemical process.
Abstract:
A semiconductor electronic device (1) is disclosed, which comprises a die (2) of semiconductor material and a support (3), the die (2) of semiconductor material including an integrated electronic circuit and a plurality of contact pads (6) associated with the electronic circuit and connected electrically to the support (3) by wire leads (4), each contact pad of said plurality of contact pads (6) comprising a lower layer (7) of copper, or alloys thereof; and an upper layer. Advantageously, the upper layer consists of: a first film (9) of nickel or alloys thereof, overlying the lower layer (7) of copper or alloys thereof; a second film of palladium or alloys thereof, overlying the first film (9) of nickel or alloys thereof; and optionally a third film (10) of gold or alloys thereof, overlying the second film of palladium or alloys thereof. Moreover, the layer or film (9, 10) are deposited by an electroless chemical process.
Abstract:
A semiconductor electronic device (1) is disclosed, which comprises a die (2) of semiconductor material and a support (3), the die (2) of semiconductor material including an integrated electronic circuit and a plurality of contact pads (6) associated with the electronic circuit and connected electrically to the support (3) by wire leads (4), each contact pad of said plurality of contact pads (6) comprising a lower layer (7) of aluminium, or alloys thereof and an upper layer. Advantageously the upper layer consists of: a first film (8) of zinc overlying the lower layer (7) of aluminium or alloys thereof; a second film (9) of nickel or alloys thereof, overlying the first film (8) of zinc; a third film of palladium or alloys thereof, overlying the second film (9) of nickel or alloys thereof; and optionally a fourth film (10) of gold or alloys thereof, overlying the third film of palladium or alloys thereof. Moreover, the layer (7) or film (8,9, 10) are deposited by an electroless chemical process.
Abstract:
A semiconductor electronic device (1) is disclosed, which comprises a die (2) of semiconductor material and a support (3), the die (2) of semiconductor material including an integrated electronic circuit and a plurality of contact pads (6) associated with the electronic circuit and connected electrically to the support (3) by wire leads (4), each contact pad of said plurality of contact pads (6) comprising a lower layer (7) of aluminium or alloys thereof, and an upper layer. Advantageously the upper layer consists of: a first film (9) of palladium or alloys thereof, overlying the lower layer (7) of aluminium or alloys thereof; and optionally a second film (10) of gold or alloys thereof, overlying the first film (9) of palladium or alloys thereof. Moreover, the layer (7) or film (9, 10) are deposited by an electroless chemical process.