Abstract:
A first film (8) is formed between a substrate (1) constituting an optical waveguide device (10) and a signal electrode (3) and ground electrodes (5), (6). A second film (9) is formed between the substrate (1) and a signal electrode (4) and ground electrodes (6), (7). The substrate (1), an optical waveguide (2), the signal electrode (3), the ground electrodes (5), (6) and the first film (8) constitute an optical phase modulator (10A). The substrate (1), the optical waveguide (2), the signal electrode (4), the ground electrodes (6), (7) and the second film (9) constitute an optical intensity modulator (10B). The optical waveguide element (10) is constituted by integrating the optical phase modulator(10A) and the optical intensity modulator (10B).
Abstract:
An optical waveguide is formed on a substrate of a material having an electr o- optic effect. An intermediate layer is formed on a major surface thereof. A metal-mounted polarizer is provided on the intermediate layer above the optical waveguide. A signal electrode and a grounding electrode are formed o n the substrate or a buffer layer. The intermediate layer is made of a dielectric having a composition AOx, B2Oy, and COz (where X represents a bivalent element, Y a trivalent element, Z a quadrivalent element, O oxygen, and 0>x>1, 0>y>3, 0>z>2) In another mode, an optical waveg uide and buffer layer are formed on a substrate of a material having an electro-optic effect , the buffer layer is partly removed by nonreactive dry-etching to form a firs t opening, a metal-mounted polarizer is formed in the first opening, and a signal electrode serving as a modulating electrode and a grounding electrode are formed on the buffer layer.
Abstract:
A first film (8) is formed between a substrate (1) and a signal electrode (3); ground electrodes (5) and (6) which constitute an optical waveguide device (10), and a second film (9) is formed between the substrate (1) and a signal electrode (4); ground electrodes (6) and (7). An optical phase modulator (10A) is composed of the substrate (1), an optical waveguide (2), the signal electrode (3), the ground electrodes (5) and (6), and the first film (8). An optical intensity modulator (10B) is composed of the substrate (1), the optical waveguide (2), the signal electrode (4), the ground electrodes (6) and (7), and the second film (9). The optical waveguide device (10) is composed of the optica l phase modulator (10A) and the optical intensity modulator (10B), which are integrated monolithically.
Abstract:
An optical waveguide is formed on a substrate of a material having an electro-optic effect. An intermediate layer is formed on a major surface thereof. A metal-mounted polarizer is provided on the intermediate layer above the optical waveguide. A signal electrode and a grounding electrode are formed on the substrate or a buffer layer. The intermediate layer is made of a dielectric having a composition AO>x 2 y z x>1, 0>y>3, 0>z>2) In another mode, an optical waveguide and buffer layer are formed on a substrate of a material having an electro-optic effect, the buffer layer is partly removed by nonreactive dry-etching to form a first opening, a metal-mounted polarizer is formed in the first opening, and a signal electrode serving as a modulating electrode and a grounding electrode are formed on the buffer layer.
Abstract:
An optical waveguide is formed on a substrate of a material having an electr o- optic effect. An intermediate layer is formed on a major surface thereof. A metal-mounted polarizer is provided on the intermediate layer above the optical waveguide. A signal electrode and a grounding electrode are formed o n the substrate or a buffer layer. The intermediate layer is made of a dielectric having a composition AOx, B2Oy, and COz (where X represents a bivalent element, Y a trivalent element, Z a quadrivalent element, O oxygen, and 0>x>1, 0>y>3, 0>z>2) In another mode, an optical waveg uide and buffer layer are formed on a substrate of a material having an electro-optic effect , the buffer layer is partly removed by nonreactive dry-etching to form a firs t opening, a metal-mounted polarizer is formed in the first opening, and a signal electrode serving as a modulating electrode and a grounding electrode are formed on the buffer layer.
Abstract:
A first film (8) is formed between a substrate (1) constituting an optical waveguide device (10) and a signal electrode (3) and ground electrodes (5), (6). A second film (9) is formed between the substrate (1) and a signal electrode (4) and ground electrodes (6), (7). The substrate (1), an optical waveguide (2), the signal electrode (3), the ground electrodes (5), (6) and the first film (8) constitute an optical phase modulator (10A). The substrate (1), the optical waveguide (2), the signal electrode (4), the ground electrodes (6), (7) and the second film (9) constitute an optical intensity modulator (10B). The optical waveguide element (10) is constituted by integrating the optical phase modulator(10A) and the optical intensity modulator (10B).
Abstract:
PROBLEM TO BE SOLVED: To provide an optical switch capable of always accurately arranging a reflection mirror at the same position and unnecessitating power in the case of maintaining the position of the reflection mirror. SOLUTION: A mirror stopper 263 fixing the arrangement of a total reflection mirror 323 when the mirror 323 is arranged in an input optical path composed of torsion bar for a supporting plate 343 for supporting a supporting plate 36, and the supporting plate 36 arranged at a position where it prevents the rotation of the mirror 323 and moved to a position where it does not become a hindrance to the rotation of the mirror 323 by energizing. A control part 11 controls the applied state of voltage so that energizing the torsion bar 303 may be cut off after energizing the torsion bar 343 is cut off after the rotation of the mirror 323 and the supporting plate 36 returns to a position where it becomes the hindrance to the rotation of the mirror 323 so as to prevent the rotation of the mirror 323.
Abstract:
PROBLEM TO BE SOLVED: To provide an optical switch which is capable of exactly switching optical paths without the deflection of a reflection surface and without the occurrence of mispositioning even when the optical paths are switched at a high speed by increasing a switching speed. SOLUTION: The reflection device provided with the input optical path and the output optical path in positions where both intersect comprises a torsion pan 30 which is arranged at an angle of about 45 deg. with the input optical path above the input optical path, a total reflection mirror 32 and a dummy mirror 34 of the same shape and the same weight as the shape and weight of the total reflection mirror 32. The dummy mirror 34 is disposed on the opposite side of the reflection mirror 32 along the axis of the torsion pan 30.