公开(公告)号：WO1994023274A1

公开(公告)日：1994-10-13

申请号：PCT/US1994003516

申请日：1994-03-30

Applicant: SUMMAGRAPHICS CORPORATION

Inventor： SUMMAGRAPHICS CORPORATION ,  McANDREW, Robert, M. ,  BRANDT, James, R. ,  HOHLE, Nathan ,  GILMORE, Patrick, T.

IPC: G01D15/28

CPC classification number: G01D15/28 ,  H04N1/0057

Abstract: A compliant skirt (26) is provided for use with a large plotter (10) and media (14) being plotted upon. The skirt (26) is attached to a platen means (18) of the plotter (10) and complies or flexes in response to the moving media (14) and follows the media (14)as it moves over the skirt (26). Such compliance of the skirt helps maintain close contact between the media (14) and compliant skirt (26) which prevents separation of the media (14) from the skirt (26) and thereby eliminates formation of media waves. In addition, compliance of the skirt (26) absorbs energy associated with excess motion of the media (14) which reduces tugging loads.

Abstract translation: 柔性裙部（26）被提供用于与大型绘图仪（10）和介质（14）一起使用。 裙部（26）附接到绘图仪（10）的压板装置（18），并响应于移动介质（14）而适应或弯曲，并且随着其在裙部（26）上移动而跟随介质（14）。 裙部的这种顺应性有助于保持介质（14）和柔性裙部（26）之间的紧密接触，防止介质（14）与裙部（26）分离，从而消除介质波的形成。 此外，裙部（26）的柔顺性吸收与介质（14）的过度运动相关联的能量，这减少了牵引负载。