Silicon thin film measuring method, silicon thin film defect detection method, and silicon thin film defect detector
    1.
    发明专利
    Silicon thin film measuring method, silicon thin film defect detection method, and silicon thin film defect detector 有权
    硅薄膜测量方法,硅薄膜缺陷检测方法和硅薄膜缺陷检测器

    公开(公告)号:JP2013217910A

    公开(公告)日:2013-10-24

    申请号:JP2013029867

    申请日:2013-02-19

    CPC classification number: G01R31/26 G01R31/2648 G01R31/265

    Abstract: PROBLEM TO BE SOLVED: To provide a silicon thin film measuring method, a silicon thin film defect detection method, and a silicon thin film defect detector.SOLUTION: A silicon thin film measuring method for measuring crystallinity of a silicon thin film sample and life of a free carrier includes steps of: arranging a capacitive sensor on the silicon thin film sample to be separated therefrom by providing a predetermined air gap; measuring the size of the air gap by utilizing the capacitive sensor without operating an exciting light source module; operating the exciting light source module to irradiate the silicon thin film sample with excitation light of ultraviolet rays; measuring variation of electric conductivity of the silicon thin film sample by utilizing the capacitive sensor; and normalizing the variation of the electric conductivity on the basis of a measurement result of the air gap.

    Abstract translation: 要解决的问题:提供硅薄膜测量方法,硅薄膜缺陷检测方法和硅薄膜缺陷检测器。解决方案:用于测量硅薄膜样品的结晶度的硅薄膜测量方法和寿命 自由载体包括以下步骤:通过提供预定的气隙在硅薄膜样品上排列电容式传感器与其分离; 通过利用电容式传感器测量气隙的尺寸而不操作激发光源模块; 操作激发光源模块,用紫外线激发光照射硅薄膜样品; 通过利用电容传感器测量硅薄膜样品的电导率的变化; 并基于气隙的测量结果对电导率的变化进行标准化。

    LASER MACHINING DEVICE
    2.
    发明公开

    公开(公告)号:US20230201962A1

    公开(公告)日:2023-06-29

    申请号:US18071041

    申请日:2022-11-29

    Abstract: A laser machining device includes: a broadband light source, which generates a broadband laser beam; a first lens unit to which the broadband laser beam is incident and having a first effective focal length; a second lens unit spaced apart from the first lens unit in a first direction and having a second effective focal length; a beam splitter disposed between the first lens unit and the second lens unit, and which is movable in the first direction and a direction opposite to the first direction within the first effective focal length from the first lens unit, and splits the broadband laser beam passing through the first lens unit into a plurality of sub-laser beams; and a focusing lens spaced apart from the second lens unit in the first direction, and which focuses the sub-laser beams passing through the second lens unit on a substrate.

    GLASS AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220162117A1

    公开(公告)日:2022-05-26

    申请号:US17529736

    申请日:2021-11-18

    Abstract: A method of manufacturing a glass includes forming a first etch protection layer on a first surface of a glass substrate, and forming a second etch protection layer on a second surface of the glass substrate; removing a part of the first protection layer and a part of the second protection layer by applying a laser pulse penetrating the glass substrate from above the first surface of the glass substrate; forming a cut part in the glass substrate by etching the glass substrate using an etching solution; and removing the first etch protection layer and the second etch protection layer. The second surface is opposite to the first surface.

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