DISPLAY APPARATUS
    3.
    发明申请

    公开(公告)号:US20250143159A1

    公开(公告)日:2025-05-01

    申请号:US18884437

    申请日:2024-09-13

    Abstract: A display apparatus includes a substrate including island areas and bridge areas, where each of the bridge areas has a serpentine shape and connects adjacent island areas to each other, a first line arranged in the bridge area, and a first insulating layer disposed on the first line, where a plurality of groove patterns is defined in the bridge areas by the first insulating layer.

    DISPLAY APPARATUS
    6.
    发明公开
    DISPLAY APPARATUS 审中-公开

    公开(公告)号:US20240130198A1

    公开(公告)日:2024-04-18

    申请号:US18239903

    申请日:2023-08-30

    Abstract: A display apparatus includes a display panel including a foldable area, and a first non-foldable area and a second non-foldable area, a cover window disposed on the display panel, and a protective layer including a soft layer and a hard layer. The soft layer is on the cover window and includes a first material, and the hard layer is on the soft layer and includes a second material having a Young's modulus greater than a Young's modulus of the first material, where the soft layer includes a hard pattern in a portion overlapping the first non-foldable area and the second non-foldable area, and the hard pattern is not in a portion overlapping the foldable area.

    WINDOW AND DISPLAY DEVICE HAVING THE SAME

    公开(公告)号:US20210083220A1

    公开(公告)日:2021-03-18

    申请号:US16926745

    申请日:2020-07-12

    Abstract: A window for a display device includes: a film having flexibility; and at least one coating layer disposed on the film. As tensile stress acting on the film increases, the film is elastically deformed in a first range of strains of the film and plastically deformed in a second range of strains of the film greater than the first range, the first and second ranges being defined by a relationship between the tensile stress and a strain of the film in accordance with the tensile stress. The film has a yield strain in a third range from about 1.9% to about 2.25%, and the yield strain is defined as the strain of the film when a yield stress of the relationship in the first range is applied to the film.

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