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    Plasma etching apparatus and method for operating the same
    1.
    发明授权
    Plasma etching apparatus and method for operating the same 有权

    公开(公告)号：US12046451B2

    公开(公告)日：2024-07-23

    申请号：US17750653

    申请日：2022-05-23

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Nam Kyun Kim ,  Seung Bo Shim ,  Doug Yong Sung ,  Seung Han Baek ,  Ju Ho Lee

    IPC: H01J37/32 ,  H01L21/3065

    CPC classification number: H01J37/32165 ,  H01J37/32183 ,  H01J37/32577 ,  H01J37/32715 ,  H01L21/3065

    Abstract: A plasma etching apparatus may include a first source electrode, a first bias electrode, and a second bias electrode configured to generate a plasma by supplying energy to a process gas injected into a chamber; and a controller. The controller may be configured to supply a first high-frequency RF power, a first low-frequency RF power, and a second low-frequency RF power to the chamber during a first period from a first time to a second time; ramp down and turn off the first high-frequency RF power to the chamber during a second period from the second time to a third time; and ramp down and turn off the first low-frequency RF power to the chamber during a third period from the second time to a fourth time different from the third time. The third period may be smaller than ½ of the first period and greater than the second period.

    Method and apparatus for random interference measurement resource pattern determination
    10.
    发明授权
    Method and apparatus for random interference measurement resource pattern determination 有权
    用于随机干扰测量资源模式确定的方法和装置

    公开(公告)号：US09426684B2

    公开(公告)日：2016-08-23

    申请号：US14404431

    申请日：2013-05-29

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Youn Sun Kim ,  Hyo Jin Lee ,  Ju Ho Lee

    IPC: H04B17/00 ,  H04W24/08 ,  H04J11/00 ,  H04L5/00 ,  H04B7/02 ,  H04B7/06

    CPC classification number: H04W24/08 ,  H04B7/024 ,  H04B7/0626 ,  H04J11/0053 ,  H04L5/0007 ,  H04L5/005 ,  H04L5/0073

    Abstract: A method and apparatus for transmitting feedback information is provided for use in a Cooperative Multi-Point downlink transmission of multiple base stations efficiently. An interference measurement method of a base station in a mobile communication system, the method comprising: allocating at least one Interference Measurement Resource (IMR) to a terminal; transmitting the allocated IMR to the terminal; and receiving at least one channel status information from the terminal; wherein allocating at least one IMR comprises allocating at least one IMR for the terminal overlapped to other IMR for the other terminal.

    Abstract translation: 提供了一种用于发送反馈信息的方法和装置，用于多个基站的协作多点下行链路传输。 1.一种移动通信系统中的基站的干扰测量方法，所述方法包括：向终端分配至少一个干扰测量资源（IMR）; 将所分配的IMR发送到终端; 以及从所述终端接收至少一个信道状态信息; 其中分配至少一个IMR包括为与其他终端重叠的其他IMR分配至少一个IMR。

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