公开(公告)号：EP3196335A1

公开(公告)日：2017-07-26

申请号：EP17152489.5

申请日：2017-01-20

Applicant: Silcotek Corp.

Inventor： VEZZA, Thomas F. ,  CONDO, Steven A. ,  DESKEVICH, Nicholas Peter ,  MATTZELA, James B. ,  SILVIS, Paul H.

IPC: C23C16/24 ,  C23C16/455

CPC classification number: C23C16/455 ,  C23C16/24 ,  C23C16/45502 ,  C23C16/46

Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.

Abstract translation: 公开了热化学气相沉积涂覆制品和热化学气相沉积工艺。 该制品包括衬底和在衬底上的热化学气相沉积涂层。 热化学气相沉积涂层包括由扩散速率受限的热化学气相沉积产生的特性。 热化学气相沉积工艺包括将气体物质引入容器并通过气体物质的扩散速率限制反应在容器内的物品上产生热化学气相沉积涂层。