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    Method of forming highly sensitive photoresist film in the absence of water
    1.
    发明授权
    Method of forming highly sensitive photoresist film in the absence of water 失效
    在不存在水的情况下形成高灵敏度光刻胶膜的方法

    公开(公告)号：US4663269A

    公开(公告)日：1987-05-05

    申请号：US763371

    申请日：1985-08-07

    Applicant: Subhash C. Narang ,  Shabbir Attarwala

    Inventor： Subhash C. Narang ,  Shabbir Attarwala

    IPC: G03F7/039 ,  G03C5/16

    CPC classification number: G03F7/039

    Abstract: Method of forming highly sensitive, high resolution positive photoresist compositions that are developed from polycarbonates derived from t-diols and various diphenols and homopolycarbonates from t-diols, mixed with 2-10% of onium salts wtih complex metal halide counterions. The high sensitivity of the photoresist compositions is due to the thermodynamic stabilities of the resulting incipient dicarbocations and dienes.

    Abstract translation: 形成高灵敏度，高分辨率的正性光致抗蚀剂组合物的方法，其由衍生自叔二醇和各种二酚的聚碳酸酯和来自叔二醇的均聚碳酸酯开发，与2-10％的鎓盐和复合金属卤化物相反离子混合。 光致抗蚀剂组合物的高灵敏度是由于所得初始二羧酸和二烯的热力学稳定性。

    Tetra ketone porphyrin monomers and the process of preparation thereof
    4.
    发明授权
    Tetra ketone porphyrin monomers and the process of preparation thereof 失效
    四酮卟啉单体及其制备方法

    公开(公告)号：US4908442A

    公开(公告)日：1990-03-13

    申请号：US247590

    申请日：1988-09-23

    Applicant: Subhash C. Narang ,  Susanna Ventura

    Inventor： Subhash C. Narang ,  Susanna Ventura

    IPC: G02F1/15 ,  C07D487/22 ,  C08G73/06 ,  C09K19/40 ,  G02F1/361 ,  H01B1/12

    CPC classification number: C07D487/22 ,  C09K19/40 ,  G02F1/3612 ,  G02F1/3619

    Abstract: The present invention relates to a tetraketone of the structure ##STR1## wherein M is a metal atom and R is selected from phenyl, alkyl substituted phenyl or halogen substituted phenyl. The process to prepare this tetraketone is disclosed. The present invention also relates to a process to produce the tetraketone structure (I). The present invention also relates to the novel polymer of the structure ##STR2## and to the process to produce this novel polymer. R is as defined hereinabove and Ar is a tetraamine substituted organic moiety having at least one aromatic ring. These polymers are useful as liquid crystals and in nonlinear optical devices.

    Abstract translation: 本发明涉及结构式I或（Ⅰ）的四酮，其中M是金属原子，R选自苯基，烷基取代的苯基或卤素取代的苯基。 公开了制备该四酮的方法。 本发明还涉及生产四酮结构（I）的方法。 本发明还涉及结构式（X）的新颖聚合物以及制备该新型聚合物的方法。 R如上所定义，Ar是具有至少一个芳环的四胺取代的有机部分。 这些聚合物可用作液晶和非线性光学器件。

    Rapid prototyping using multiple materials
    5.
    发明授权
    Rapid prototyping using multiple materials 失效
    使用多种材料进行快速原型制作

    公开(公告)号：US5980813A

    公开(公告)日：1999-11-09

    申请号：US105858

    申请日：1998-06-26

    Applicant: Subhash C. Narang ,  Susanna C. Ventura ,  Sunity Sharma ,  John S. Stotts

    Inventor： Subhash C. Narang ,  Susanna C. Ventura ,  Sunity Sharma ,  John S. Stotts

    IPC: B28B1/30 ,  B29C67/00 ,  B29C35/08 ,  B29C41/02

    CPC classification number: B29C67/0092 ,  B29K2995/0073

    Abstract: Novel compositions and methods are provided for use in the stepwise, layer by layer fabrication of three-dimensional objects, in which a build material contains a metal having a covalent bond to a non-metal, and the layers are processed to produce the three-dimensional object at least in part through a chemical reaction which alters the covalent bond of the metal. In a first aspect of the invention the build material includes a metal that is covalently bound to a polymeric precursor. In another aspect of the invention, the build material includes a metal, Me, that is covalently bound to a first ligand, L.sub.1. Following deposition of the build material, the first ligand undergoes a redox reaction with a second ligand, L.sub.2, thereby breaking the covalent bond of the metal. In more preferred embodiments of this class, L.sub.1 and L.sub.2 react to form a gas, and the metal reacts to form an oxide such as MeSO.sub.x, MeNO.sub.x, MeCO.sub.x and so forth. In yet another aspect of the invention, multiple build materials are employed to provide non-uniformities such as electrical, thermal, and magnetic conduction paths, structural supports, chemical and wear resistant areas, and so forth.

    Abstract translation: 提供了新颖的组合物和方法用于逐层逐层制造三维物体，其中构建材料包含与非金属共价键的金属，并且这些层被加工以产生三维物体， 至少部分地通过化学反应改变金属的共价键。 在本发明的第一方面，构建材料包括与聚合物前体共价结合的金属。 在本发明的另一方面，构建材料包括与第一配体L1共价结合的金属Me。 在构建材料沉积之后，第一配体与第二配体L2进行氧化还原反应，从而破坏金属的共价键。 在该类的更优选的实施方案中，L1和L2反应形成气体，并且金属反应形成氧化物，例如MeSO x，MeNO x，MeCO x等。 在本发明的另一方面，使用多种构建材料来提供不均匀性，例如电，热和磁传导路径，结构支撑，化学和耐磨区域等。

    Synergistic corrosion inhibitors based on substituted pyridinium compounds
    8.
    发明授权
    Synergistic corrosion inhibitors based on substituted pyridinium compounds 失效
    基于取代的吡啶鎓化合物的协同腐蚀抑制剂

    公开(公告)号：US5132093A

    公开(公告)日：1992-07-21

    申请号：US582796

    申请日：1990-09-13

    Applicant: Samson Hettiarachchi ,  Subhash C. Narang ,  Digby D. Macdonald

    Inventor： Samson Hettiarachchi ,  Subhash C. Narang ,  Digby D. Macdonald

    IPC: A01N43/40 ,  A01N55/00 ,  A01N55/04 ,  A01N57/24 ,  C07D213/70 ,  C07D213/74 ,  C07F7/08 ,  C07F7/10 ,  C07F7/22 ,  C07F9/58 ,  C07F9/6568 ,  C09K3/18 ,  C23F11/14 ,  C23F11/16

    CPC classification number: C07D213/70 ,  A01N43/40 ,  A01N55/00 ,  A01N55/04 ,  A01N57/24 ,  C07D213/74 ,  C07F7/0814 ,  C07F7/2212 ,  C07F9/587 ,  C07F9/65683 ,  C23F11/04 ,  C23F11/141 ,  C23F11/149 ,  C23F11/16

    Abstract: The present invention relates to a compound of the formula: ##STR1## wherein (a) A is independently selected from --SR.sup.1, --NR.sup.1 R.sup.2, --PR.sup.1 R.sup.2, --Si,R.sup.1 R.sup.2 R.sup.3, or --SnR.sup.1 R.sup.2 R.sup.3,R.sup.1, R.sup.2 and R.sup.3 are each independently selected from alkyl, cycloalkyl, alkylcycloalkyl, arylalkyl having from 1 to 20 carbon atoms or aryl, substituted aryl, or where R.sup.2 and R.sup.3 together form a heterocycle group, having from 4 to 20 carbon atoms, andn is an integer from 1 to 5;(b) Y is selected from a direct bond or --CR.sup.4 R.sup.5 --, wherein R.sup.4 and R.sup.5 are each independently selected from hydrogen, or alkyl group having 1 to 20 carbon atoms or R.sup.4 and R.sup.5 together form a cycloalkyl group having 4 to 20 carbon atoms;(c) Z is aryl or substituted aryl; and(d) X is halogen, sulfonate, carboxylate, phosphate, carbonate, sulfate, or MD.sub.m wherein M is boron, phosphorous, arsenic, antimony or silicon, D is fluorine, chlorine, bromine or iodine and m is 2, 3 or 4. These compounds are useful as synergistic corrosion inhibitors for metals. These compounds are also useful as bacteriostats, antifungal agents and as deicing agents as surfactants.

    Abstract translation: 本发明涉及下式化合物：其中（a）A独立地选自-SR1，-NR1R2，-PR1R2，-Si，R1R2R3或-SnR1R2R3，R1，R2和R3各自独立地选自 由烷基，环烷基，烷基环烷基，具有1至20个碳原子的芳基烷基或芳基，取代的芳基，或其中R2和R3一起形成具有4至20个碳原子的杂环基，n为1至5的整数; （b）Y选自直接键或-CR 4 R 5 - ，其中R 4和R 5各自独立地选自氢或具有1至20个碳原子的烷基或R 4和R 5一起形成具有4至20个碳原子的环烷基 ; （c）Z是芳基或取代的芳基; 和（d）X是卤素，磺酸盐，羧酸盐，磷酸盐，碳酸盐，硫酸盐或MDm，其中M是硼，磷，砷，锑或硅，D是氟，氯，溴或碘，m是2,3或4 这些化合物可用作金属的协同腐蚀抑制剂。 这些化合物也可用作抑菌剂，抗真菌剂和作为表面活性剂的除冰剂。

    Solid electrolyte
    9.
    发明授权
    Solid electrolyte 失效
    固体电解质

    公开(公告)号：US4888257A

    公开(公告)日：1989-12-19

    申请号：US330326

    申请日：1989-03-28

    Applicant: Subhash C. Narang

    Inventor： Subhash C. Narang

    IPC: C08G77/46 ,  C08K3/00 ,  H01B1/12 ,  H01M6/18 ,  H01M10/36 ,  H01M10/40

    CPC classification number: H01M6/181 ,  C08K3/0083 ,  H01B1/122

    Abstract: A solid electrolyte comprising a polymer containing therein at least 50 mol % of a recurring unit represented by general formula (I): ##STR1## wherein L.sub.1 and L.sub.2 are each a divalent linking group; R.sub.1 and R.sub.2 are each hydrogen, an alkyl group, or an aryl group; m and p are each an integer of from 1 to 10; X.sub.1 and X.sub.2 are each --O-- or --S--; n is an integer of from 10 to 100; a and b are each integers of from 0 to 10; and c is 0 or 1, provided that when c is 0, then a or b is at least 1, and a salt of a metal ion belonging to Group I or Group II of the Periodic Table.

    Abstract translation: 一种固体电解质，其包含含有至少50摩尔％的由通式（I）表示的重复单元的聚合物：其中L1和L2各自为二价连接基团; R1和R2各自为氢，烷基或芳基; m和p各自为1至10的整数; X 1和X 2各自为-O-或-S-; n为10〜100的整数， a和b各自为0至10的整数; 并且c为0或1，条件是当c为0时，a或b为至少1，并且属于元素周期表第I族或第II族的金属离子的盐。

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